Fabrication and Performance of MEMS-Based Pressure Sensor Packages Using Patterned Ultra-Thick Photoresists
A novel plastic packaging of a piezoresistive pressure sensor using a patterned ultra-thick photoresist is experimentally and theoretically investigated. Two pressure sensor packages of the sacrifice-replacement and dam-ring type were used in this study. The characteristics of the packaged pressure...
Main Authors: | Wood-Hi Cheng, Lung-Tai Chen, Jin-Sheng Chang, Chung-Yi Hsu |
---|---|
Format: | Article |
Language: | English |
Published: |
MDPI AG
2009-08-01
|
Series: | Sensors |
Subjects: | |
Online Access: | http://www.mdpi.com/1424-8220/9/8/6200/ |
Similar Items
-
Fabrication of Multilayer Molds by Dry Film Photoresist
by: Narek E. Koucherian, et al.
Published: (2022-09-01) -
Negative-tone molecular glass photoresist for high-resolution electron beam lithography
by: Yafei Wang, et al.
Published: (2021-03-01) -
Exceptional Lithography Sensitivity Boosted by Hexafluoroisopropanols in Photoresists
by: Junjun Liu, et al.
Published: (2024-03-01) -
Progress in Polyhedral Oligomeric Silsesquioxane (POSS) Photoresists: A Comprehensive Review across Lithographic Systems
by: Zaoxia Wen, et al.
Published: (2024-03-01) -
Comprehensive Simulations for Ultraviolet Lithography Process of Thick SU-8 Photoresist
by: Zai-Fa Zhou, et al.
Published: (2018-07-01)