Sputtering of lithium and lithium compound films under deuterium and helium ion bombardment
Conditioning of plasma facing components (PFCs) using lithium (Li) evaporation has shown to improve plasma performance in fusion devices by imposing low recycling boundary conditions. It is important to understand the retention and sputtering dynamics of deuterium (D) in Li and Li compound (LiO and...
| Main Authors: | , , , , , |
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| Format: | Article |
| Language: | English |
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Elsevier
2019-05-01
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| Series: | Nuclear Materials and Energy |
| Online Access: | http://www.sciencedirect.com/science/article/pii/S2352179118302473 |
| _version_ | 1811226314870358016 |
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| author | L. Buzi A.O. Nelson Y. Yang R. Kaita P.S. Krstić B.E. Koel |
| author_facet | L. Buzi A.O. Nelson Y. Yang R. Kaita P.S. Krstić B.E. Koel |
| author_sort | L. Buzi |
| collection | DOAJ |
| description | Conditioning of plasma facing components (PFCs) using lithium (Li) evaporation has shown to improve plasma performance in fusion devices by imposing low recycling boundary conditions. It is important to understand the retention and sputtering dynamics of deuterium (D) in Li and Li compound (LiO and LiCO) films to most efficiently make predictions on plasma performance. Energetic D2+ incident on thin Li films is shown to readily form LiD leading to a lower Li sputtering yield than the sputtering yield of pure Li. Measured sputtering yields for thin LiD films agree with previous simulations and bulk erosion measurements. The He+ sputtering yield of pure Li was 2–3 times higher than the sputtering yield of D2+ on LiD. Incident 1000–1200 eV/D2+ sputtered LiO films at a slower rate than D2+ on LiD and LiCO films. Keywords: Deuterium retention, Lithium carbonate, Lithium deuteride, Sputtering, Thin films |
| first_indexed | 2024-04-12T09:23:08Z |
| format | Article |
| id | doaj.art-dc57f9a59aa94626a0b576d4cc3217ff |
| institution | Directory Open Access Journal |
| issn | 2352-1791 |
| language | English |
| last_indexed | 2024-04-12T09:23:08Z |
| publishDate | 2019-05-01 |
| publisher | Elsevier |
| record_format | Article |
| series | Nuclear Materials and Energy |
| spelling | doaj.art-dc57f9a59aa94626a0b576d4cc3217ff2022-12-22T03:38:34ZengElsevierNuclear Materials and Energy2352-17912019-05-0119411415Sputtering of lithium and lithium compound films under deuterium and helium ion bombardmentL. Buzi0A.O. Nelson1Y. Yang2R. Kaita3P.S. Krstić4B.E. Koel5Department of Chemical and Biological Engineering, Princeton University, A311 EQuad, Olden Street, Princeton, NJ 08544-5263, United StatesDepartment of Astrophysical Sciences, Princeton Program in Plasma Physics, Princeton University, Princeton, NJ 08544, United StatesDepartment of Chemical and Biological Engineering, Princeton University, A311 EQuad, Olden Street, Princeton, NJ 08544-5263, United StatesPrinceton Plasma Physics Laboratory, Princeton, NJ 08540, United StatesInstitute for Advanced Computational Science, Stony Brook University, NY 11794, United StatesDepartment of Chemical and Biological Engineering, Princeton University, A311 EQuad, Olden Street, Princeton, NJ 08544-5263, United States; Corresponding author.Conditioning of plasma facing components (PFCs) using lithium (Li) evaporation has shown to improve plasma performance in fusion devices by imposing low recycling boundary conditions. It is important to understand the retention and sputtering dynamics of deuterium (D) in Li and Li compound (LiO and LiCO) films to most efficiently make predictions on plasma performance. Energetic D2+ incident on thin Li films is shown to readily form LiD leading to a lower Li sputtering yield than the sputtering yield of pure Li. Measured sputtering yields for thin LiD films agree with previous simulations and bulk erosion measurements. The He+ sputtering yield of pure Li was 2–3 times higher than the sputtering yield of D2+ on LiD. Incident 1000–1200 eV/D2+ sputtered LiO films at a slower rate than D2+ on LiD and LiCO films. Keywords: Deuterium retention, Lithium carbonate, Lithium deuteride, Sputtering, Thin filmshttp://www.sciencedirect.com/science/article/pii/S2352179118302473 |
| spellingShingle | L. Buzi A.O. Nelson Y. Yang R. Kaita P.S. Krstić B.E. Koel Sputtering of lithium and lithium compound films under deuterium and helium ion bombardment Nuclear Materials and Energy |
| title | Sputtering of lithium and lithium compound films under deuterium and helium ion bombardment |
| title_full | Sputtering of lithium and lithium compound films under deuterium and helium ion bombardment |
| title_fullStr | Sputtering of lithium and lithium compound films under deuterium and helium ion bombardment |
| title_full_unstemmed | Sputtering of lithium and lithium compound films under deuterium and helium ion bombardment |
| title_short | Sputtering of lithium and lithium compound films under deuterium and helium ion bombardment |
| title_sort | sputtering of lithium and lithium compound films under deuterium and helium ion bombardment |
| url | http://www.sciencedirect.com/science/article/pii/S2352179118302473 |
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