Exceptional Lithography Sensitivity Boosted by Hexafluoroisopropanols in Photoresists

Exceptional Lithography Sensitivity Boosted by Hexafluoroisopropanols in Photoresists

Advanced lithography requires highly sensitive photoresists to improve the lithographic efficiency, and it is critical, yet challenging, to develop high-sensitivity photoresists and imaging strategies. Here, we report a novel strategy for ultra-high sensitivity using hexafluoroisopropanol (HFIP)-con...

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Bibliographic Details
Main Authors:	Junjun Liu, Dong Wang, Yitan Li, Haihua Wang, Huan Chen, Qianqian Wang, Wenbing Kang
Format:	Article
Language:	English
Published:	MDPI AG 2024-03-01
Series:	Polymers
Subjects:	hexafluoroisopropanol high sensitivity photoresist photoacid generation
Online Access:	https://www.mdpi.com/2073-4360/16/6/825

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