Exploring the Dual Characteristics of CH<sub>3</sub>OH Adsorption to Metal Atomic Structures on Si (111)-7 × 7 Surface
Metal atoms were deposited on an Si (111)-7 × 7 surface, and they were adsorbed with alcohol gases (CH<sub>3</sub>OH/C<sub>2</sub>H<sub>5</sub>OH/C<sub>3</sub>H<sub>7</sub>OH). Initially, C<sub>n</sub>H<sub>2n+1</sub>...
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MDPI AG
2021-09-01
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| Series: | Molecules |
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| Online Access: | https://www.mdpi.com/1420-3049/26/19/5824 |
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| author | Wenxin Li Jiawen Wang Wanyu Ding Youping Gong Huipeng Chen Dongying Ju |
| author_facet | Wenxin Li Jiawen Wang Wanyu Ding Youping Gong Huipeng Chen Dongying Ju |
| author_sort | Wenxin Li |
| collection | DOAJ |
| description | Metal atoms were deposited on an Si (111)-7 × 7 surface, and they were adsorbed with alcohol gases (CH<sub>3</sub>OH/C<sub>2</sub>H<sub>5</sub>OH/C<sub>3</sub>H<sub>7</sub>OH). Initially, C<sub>n</sub>H<sub>2n+1</sub>OH adsorption was simply used as an intermediate layer to prevent the chemical reaction between metal and Si atoms. Through scanning tunneling microscopy (STM) and a mass spectrometer, the C<sub>n</sub>H<sub>2n+1</sub>OH dissociation process is further derived as the construction of a surface quasi-potential with horizontal and vertical directions. With the help of three typical metal depositions, the surface characteristics of CH<sub>3</sub>OH adsorption are more clearly presented in this paper. Adjusting the preheating temperature, the difference of thermal stability between CH<sub>3</sub>O<sup>–</sup> and H<sup>+</sup> could be obviously derived in Au deposition. After a large amount of H<sup>+</sup> was separated, the isolation characteristic of CH<sub>3</sub>O<sup>–</sup> was discussed in the case of Fe deposition. In the process of building a new metal-CH<sub>3</sub>O<sup>–</sup>-H<sup>+</sup> model, the dual characteristics of CH<sub>3</sub>OH were synthetically verified in Sn deposition. CH<sub>3</sub>O<sup>–</sup> adsorption is prone to influencing the interaction between the metal deposition and substrate surface in the vertical direction, while H<sup>+</sup> adsorption determines the horizontal behavior of metal atoms. These investigations lead one to believe that, to a certain extent, the formation of regular metal atomic structures on the Si (111)-7 × 7-CH<sub>3</sub>OH surface is promoted, especially according to the dual characteristics and adsorption models we explored. |
| first_indexed | 2024-03-10T06:55:28Z |
| format | Article |
| id | doaj.art-dcc432fc51f143bbb5417fff688833c2 |
| institution | Directory Open Access Journal |
| issn | 1420-3049 |
| language | English |
| last_indexed | 2024-03-10T06:55:28Z |
| publishDate | 2021-09-01 |
| publisher | MDPI AG |
| record_format | Article |
| series | Molecules |
| spelling | doaj.art-dcc432fc51f143bbb5417fff688833c22023-11-22T16:33:12ZengMDPI AGMolecules1420-30492021-09-012619582410.3390/molecules26195824Exploring the Dual Characteristics of CH<sub>3</sub>OH Adsorption to Metal Atomic Structures on Si (111)-7 × 7 SurfaceWenxin Li0Jiawen Wang1Wanyu Ding2Youping Gong3Huipeng Chen4Dongying Ju5College of Mechanical Engineering, Hangzhou Dianzi University, Hangzhou 310018, ChinaCollege of Mechanical Engineering, Hangzhou Dianzi University, Hangzhou 310018, ChinaSchool of Material Science and Engineering, Dalian Jiaotong University, Dalian 116028, ChinaCollege of Mechanical Engineering, Hangzhou Dianzi University, Hangzhou 310018, ChinaCollege of Mechanical Engineering, Hangzhou Dianzi University, Hangzhou 310018, ChinaDepartment of High-Tech Research Center, Saitama Institute of Technology, Fusaiji 1690, Fukaya 369-0293, JapanMetal atoms were deposited on an Si (111)-7 × 7 surface, and they were adsorbed with alcohol gases (CH<sub>3</sub>OH/C<sub>2</sub>H<sub>5</sub>OH/C<sub>3</sub>H<sub>7</sub>OH). Initially, C<sub>n</sub>H<sub>2n+1</sub>OH adsorption was simply used as an intermediate layer to prevent the chemical reaction between metal and Si atoms. Through scanning tunneling microscopy (STM) and a mass spectrometer, the C<sub>n</sub>H<sub>2n+1</sub>OH dissociation process is further derived as the construction of a surface quasi-potential with horizontal and vertical directions. With the help of three typical metal depositions, the surface characteristics of CH<sub>3</sub>OH adsorption are more clearly presented in this paper. Adjusting the preheating temperature, the difference of thermal stability between CH<sub>3</sub>O<sup>–</sup> and H<sup>+</sup> could be obviously derived in Au deposition. After a large amount of H<sup>+</sup> was separated, the isolation characteristic of CH<sub>3</sub>O<sup>–</sup> was discussed in the case of Fe deposition. In the process of building a new metal-CH<sub>3</sub>O<sup>–</sup>-H<sup>+</sup> model, the dual characteristics of CH<sub>3</sub>OH were synthetically verified in Sn deposition. CH<sub>3</sub>O<sup>–</sup> adsorption is prone to influencing the interaction between the metal deposition and substrate surface in the vertical direction, while H<sup>+</sup> adsorption determines the horizontal behavior of metal atoms. These investigations lead one to believe that, to a certain extent, the formation of regular metal atomic structures on the Si (111)-7 × 7-CH<sub>3</sub>OH surface is promoted, especially according to the dual characteristics and adsorption models we explored.https://www.mdpi.com/1420-3049/26/19/5824STMdual characteristicscluster structuremetal-CH<sub>3</sub>O<sup>–</sup>-H<sup>+</sup> model |
| spellingShingle | Wenxin Li Jiawen Wang Wanyu Ding Youping Gong Huipeng Chen Dongying Ju Exploring the Dual Characteristics of CH<sub>3</sub>OH Adsorption to Metal Atomic Structures on Si (111)-7 × 7 Surface Molecules STM dual characteristics cluster structure metal-CH<sub>3</sub>O<sup>–</sup>-H<sup>+</sup> model |
| title | Exploring the Dual Characteristics of CH<sub>3</sub>OH Adsorption to Metal Atomic Structures on Si (111)-7 × 7 Surface |
| title_full | Exploring the Dual Characteristics of CH<sub>3</sub>OH Adsorption to Metal Atomic Structures on Si (111)-7 × 7 Surface |
| title_fullStr | Exploring the Dual Characteristics of CH<sub>3</sub>OH Adsorption to Metal Atomic Structures on Si (111)-7 × 7 Surface |
| title_full_unstemmed | Exploring the Dual Characteristics of CH<sub>3</sub>OH Adsorption to Metal Atomic Structures on Si (111)-7 × 7 Surface |
| title_short | Exploring the Dual Characteristics of CH<sub>3</sub>OH Adsorption to Metal Atomic Structures on Si (111)-7 × 7 Surface |
| title_sort | exploring the dual characteristics of ch sub 3 sub oh adsorption to metal atomic structures on si 111 7 7 surface |
| topic | STM dual characteristics cluster structure metal-CH<sub>3</sub>O<sup>–</sup>-H<sup>+</sup> model |
| url | https://www.mdpi.com/1420-3049/26/19/5824 |
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