Structural, Compositional, and Plasmonic Characteristics of Ti–Zr Ternary Nitride Thin Films Tuned by the Nitrogen Flow Ratio in Magnetron Sputtering

Structural, Compositional, and Plasmonic Characteristics of Ti–Zr Ternary Nitride Thin Films Tuned by the Nitrogen Flow Ratio in Magnetron Sputtering

Ternary nitride gives high diversity and tunability of the plasmonic materials. In this work, highly crystallized ternary (Ti, Zr)N<inline-formula> <math display="inline"> <semantics> <msub> <mrow></mrow> <mi>x</mi> </msub> </semanti...

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Bibliographic Details
Main Authors: Lianlian Chen, Yujing Ran, Zhaotan Jiang, Yinglan Li, Zhi Wang
Format: Article
Language:English
Published: MDPI AG 2020-04-01
Series:Nanomaterials
Subjects:
ternary system
nitride
thin films
Online Access:https://www.mdpi.com/2079-4991/10/5/829

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