Stacking sequence and interlayer coupling in few-layer graphene revealed by in situ imaging

Controlled preparation of few-layer graphene is a promising, yet challenging technological protocol. Here, the authors perform real-time imaging during chemical vapour deposition growth and hydrogen etching, to gain insight into layer-dependent growth mechanisms and graphene-substrate interaction.

Bibliographic Details
Main Authors: Zhu-Jun Wang, Jichen Dong, Yi Cui, Gyula Eres, Olaf Timpe, Qiang Fu, Feng Ding, R. Schloegl, Marc-Georg Willinger
Format: Article
Language:English
Published: Nature Portfolio 2016-10-01
Series:Nature Communications
Online Access:https://doi.org/10.1038/ncomms13256
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author Zhu-Jun Wang
Jichen Dong
Yi Cui
Gyula Eres
Olaf Timpe
Qiang Fu
Feng Ding
R. Schloegl
Marc-Georg Willinger
author_facet Zhu-Jun Wang
Jichen Dong
Yi Cui
Gyula Eres
Olaf Timpe
Qiang Fu
Feng Ding
R. Schloegl
Marc-Georg Willinger
author_sort Zhu-Jun Wang
collection DOAJ
description Controlled preparation of few-layer graphene is a promising, yet challenging technological protocol. Here, the authors perform real-time imaging during chemical vapour deposition growth and hydrogen etching, to gain insight into layer-dependent growth mechanisms and graphene-substrate interaction.
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spelling doaj.art-deba96c459e1494b9dbb6d1322908fa02022-12-21T20:36:00ZengNature PortfolioNature Communications2041-17232016-10-017111210.1038/ncomms13256Stacking sequence and interlayer coupling in few-layer graphene revealed by in situ imagingZhu-Jun Wang0Jichen Dong1Yi Cui2Gyula Eres3Olaf Timpe4Qiang Fu5Feng Ding6R. Schloegl7Marc-Georg Willinger8Department of Inorganic Chemistry, Fritz Haber Institute of the Max Planck SocietyInstitute of Textiles and Clothing, Hong Kong Polytechnic UniversityVacuum Interconnected Nanotech Workstation, Suzhou Institute of Nano-Tech and Nano-Bionics, Chinese Academy of SciencesMaterials Science and Technology Division, Oak Ridge National LaboratoryDepartment of Inorganic Chemistry, Fritz Haber Institute of the Max Planck SocietyState Key Laboratory of Catalysis, Dalian Institute of Chemical Physics, Chinese Academy of SciencesInstitute of Textiles and Clothing, Hong Kong Polytechnic UniversityDepartment of Inorganic Chemistry, Fritz Haber Institute of the Max Planck SocietyDepartment of Inorganic Chemistry, Fritz Haber Institute of the Max Planck SocietyControlled preparation of few-layer graphene is a promising, yet challenging technological protocol. Here, the authors perform real-time imaging during chemical vapour deposition growth and hydrogen etching, to gain insight into layer-dependent growth mechanisms and graphene-substrate interaction.https://doi.org/10.1038/ncomms13256
spellingShingle Zhu-Jun Wang
Jichen Dong
Yi Cui
Gyula Eres
Olaf Timpe
Qiang Fu
Feng Ding
R. Schloegl
Marc-Georg Willinger
Stacking sequence and interlayer coupling in few-layer graphene revealed by in situ imaging
Nature Communications
title Stacking sequence and interlayer coupling in few-layer graphene revealed by in situ imaging
title_full Stacking sequence and interlayer coupling in few-layer graphene revealed by in situ imaging
title_fullStr Stacking sequence and interlayer coupling in few-layer graphene revealed by in situ imaging
title_full_unstemmed Stacking sequence and interlayer coupling in few-layer graphene revealed by in situ imaging
title_short Stacking sequence and interlayer coupling in few-layer graphene revealed by in situ imaging
title_sort stacking sequence and interlayer coupling in few layer graphene revealed by in situ imaging
url https://doi.org/10.1038/ncomms13256
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