The microstructural changes of Ge2Sb2Te5 thin film during crystallization process
Phase change memory is known as the most promising candidate for the next generation nonvolatile memory technology. In this paper, the microstructural changes of Ge2Sb2Te5 film, which is the most common choice of phase change memory material, has been carefully studied by the combination of several...
Main Authors: | Jingbo Xu, Chao Qi, Limin Chen, Long Zheng, Qiyun Xie |
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Format: | Article |
Language: | English |
Published: |
AIP Publishing LLC
2018-05-01
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Series: | AIP Advances |
Online Access: | http://dx.doi.org/10.1063/1.5025204 |
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