Electric Double Layer Field Effect Transistor Using SnS Thin Film as Semiconductor Channel Layer and Honey Gate Dieletric

The study aimed at the investigation and application of SnS thin film semiconductor as a channel layer semiconductor in the assembly of an electric double layer field effect transistor which is important for the achievement and development of novel device concepts, applications and tuning of physica...

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Main Authors: Thomas Daniel, Uno Uno, Kasim Isah, Umaru Ahmadu
Format: Article
Language:English
Published: V.N. Karazin Kharkiv National University Publishing 2019-10-01
Series:East European Journal of Physics
Subjects:
Online Access:https://periodicals.karazin.ua/eejp/article/view/14363
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author Thomas Daniel
Uno Uno
Kasim Isah
Umaru Ahmadu
author_facet Thomas Daniel
Uno Uno
Kasim Isah
Umaru Ahmadu
author_sort Thomas Daniel
collection DOAJ
description The study aimed at the investigation and application of SnS thin film semiconductor as a channel layer semiconductor in the assembly of an electric double layer field effect transistor which is important for the achievement and development of novel device concepts, applications and tuning of physical properties of materials since the reported EDLFET and the modulation of electronic states have so far been realised on oxides, nitrides, carbon nanotubes and organic semiconductor but has been rarely reported for the chalcogenides. Honey was used as a gel like electrolytic gate dielectric to generate an enhanced electric field response over SnS semiconductor channel layer and due to its ability to produces high on-current and low voltage operation while forming an ionic gel-like solution similar to ionic gels which consist of ionic liguids. SnS gated honey Electric double layer field effect transistor was assembled using tin sulphide (SnS) thin film as semiconductor channel layer and honey as gate dielectric. The measured gate capacitance of honey using LCR meter was measured as 2.15 μF/ cm2 while the dielectric constant is 20.50. The semiconductor layer was deposited using Aerosol assisted chemical vapour deposition and annealed in open air at 250  on an etched region about the middle of a 4×4 mm FTO glass substrate with the source and drain electrode region defined by the etching and masking at the two ends of the substrate. Iridium was used as the gate electrode while a copper wire was masked to the source and drain region to create electrode contact. The Profilometry, X-ray diffraction, Scanning electron microscope, Energy dispersive X-ray spectroscopy, Hall Effect measurement and digital multimeters were used to characterise the device. The SnS thin film was found to be polycrystalline consisting of Sn and S elements with define grains, an optical band of 1.42 eV and of 0.4 μm thickness. The transistor operated with a p type channel conductivity in a depletion mode with a field effect mobility of 16.67 cm2/Vs, cut-off voltage of 1.6 V, Drain saturation current of1.35μA, a transconductance of -809.61 nA/V and a sub threshold slope of -1.6 Vdec-1 which is comparable to standard specifications in Electronics Data sheets. Positive gate bias results in a shift in the cut off voltage due to charge trapping in the channel/dielectric interface.
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spelling doaj.art-e160ece4416944118f2f6cf68d9d2be02022-12-21T20:08:03ZengV.N. Karazin Kharkiv National University PublishingEast European Journal of Physics2312-43342312-45392019-10-013718010.26565/2312-4334-2019-3-0914363Electric Double Layer Field Effect Transistor Using SnS Thin Film as Semiconductor Channel Layer and Honey Gate DieletricThomas Daniel0Uno Uno1Kasim Isah2Umaru Ahmadu3Department of Physics/Geology/Geophysics, Alex Ekwueme-Federal University Ndufu-Alike Ikwo, Ebonyi state, NigeriaDepartment of Physics, Federal University of Technology Minna, Minna, Niger state, NigeriaDepartment of Physics, Federal University of Technology Minna, Minna, Niger state, NigeriaDepartment of Physics, Federal University of Technology Minna, Minna, Niger state, NigeriaThe study aimed at the investigation and application of SnS thin film semiconductor as a channel layer semiconductor in the assembly of an electric double layer field effect transistor which is important for the achievement and development of novel device concepts, applications and tuning of physical properties of materials since the reported EDLFET and the modulation of electronic states have so far been realised on oxides, nitrides, carbon nanotubes and organic semiconductor but has been rarely reported for the chalcogenides. Honey was used as a gel like electrolytic gate dielectric to generate an enhanced electric field response over SnS semiconductor channel layer and due to its ability to produces high on-current and low voltage operation while forming an ionic gel-like solution similar to ionic gels which consist of ionic liguids. SnS gated honey Electric double layer field effect transistor was assembled using tin sulphide (SnS) thin film as semiconductor channel layer and honey as gate dielectric. The measured gate capacitance of honey using LCR meter was measured as 2.15 μF/ cm2 while the dielectric constant is 20.50. The semiconductor layer was deposited using Aerosol assisted chemical vapour deposition and annealed in open air at 250  on an etched region about the middle of a 4×4 mm FTO glass substrate with the source and drain electrode region defined by the etching and masking at the two ends of the substrate. Iridium was used as the gate electrode while a copper wire was masked to the source and drain region to create electrode contact. The Profilometry, X-ray diffraction, Scanning electron microscope, Energy dispersive X-ray spectroscopy, Hall Effect measurement and digital multimeters were used to characterise the device. The SnS thin film was found to be polycrystalline consisting of Sn and S elements with define grains, an optical band of 1.42 eV and of 0.4 μm thickness. The transistor operated with a p type channel conductivity in a depletion mode with a field effect mobility of 16.67 cm2/Vs, cut-off voltage of 1.6 V, Drain saturation current of1.35μA, a transconductance of -809.61 nA/V and a sub threshold slope of -1.6 Vdec-1 which is comparable to standard specifications in Electronics Data sheets. Positive gate bias results in a shift in the cut off voltage due to charge trapping in the channel/dielectric interface.https://periodicals.karazin.ua/eejp/article/view/14363SnS thin filmField effect transistorHoneyElectric double layer
spellingShingle Thomas Daniel
Uno Uno
Kasim Isah
Umaru Ahmadu
Electric Double Layer Field Effect Transistor Using SnS Thin Film as Semiconductor Channel Layer and Honey Gate Dieletric
East European Journal of Physics
SnS thin film
Field effect transistor
Honey
Electric double layer
title Electric Double Layer Field Effect Transistor Using SnS Thin Film as Semiconductor Channel Layer and Honey Gate Dieletric
title_full Electric Double Layer Field Effect Transistor Using SnS Thin Film as Semiconductor Channel Layer and Honey Gate Dieletric
title_fullStr Electric Double Layer Field Effect Transistor Using SnS Thin Film as Semiconductor Channel Layer and Honey Gate Dieletric
title_full_unstemmed Electric Double Layer Field Effect Transistor Using SnS Thin Film as Semiconductor Channel Layer and Honey Gate Dieletric
title_short Electric Double Layer Field Effect Transistor Using SnS Thin Film as Semiconductor Channel Layer and Honey Gate Dieletric
title_sort electric double layer field effect transistor using sns thin film as semiconductor channel layer and honey gate dieletric
topic SnS thin film
Field effect transistor
Honey
Electric double layer
url https://periodicals.karazin.ua/eejp/article/view/14363
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AT unouno electricdoublelayerfieldeffecttransistorusingsnsthinfilmassemiconductorchannellayerandhoneygatedieletric
AT kasimisah electricdoublelayerfieldeffecttransistorusingsnsthinfilmassemiconductorchannellayerandhoneygatedieletric
AT umaruahmadu electricdoublelayerfieldeffecttransistorusingsnsthinfilmassemiconductorchannellayerandhoneygatedieletric