Development of Autopolymerizing Resin Material with Antimicrobial Properties Using Montmorillonite and Nanoporous Silica
Although autopolymerizing resin offers numerous applications in orthodontic treatment, plaque tends to accumulate between the appliance and the mucosa, which increases the number of microorganisms present. In this study, we added cetylpyridinium chloride (CPC) loaded montmorillonite (Mont) and nanop...
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| Format: | Article |
| Language: | English |
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MDPI AG
2023-02-01
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| Series: | Pharmaceutics |
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| Online Access: | https://www.mdpi.com/1999-4923/15/2/544 |
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| author | Shuhei Otsubo Ko Nakanishi Kakufu Fukukawa Ryoshun Endo Seiichiro Yoshida Aiko Matsumoto Kumiko Yoshihara Tsukasa Akasaka Akira Hasebe Yasuhiro Yoshida Yoshiaki Sato |
| author_facet | Shuhei Otsubo Ko Nakanishi Kakufu Fukukawa Ryoshun Endo Seiichiro Yoshida Aiko Matsumoto Kumiko Yoshihara Tsukasa Akasaka Akira Hasebe Yasuhiro Yoshida Yoshiaki Sato |
| author_sort | Shuhei Otsubo |
| collection | DOAJ |
| description | Although autopolymerizing resin offers numerous applications in orthodontic treatment, plaque tends to accumulate between the appliance and the mucosa, which increases the number of microorganisms present. In this study, we added cetylpyridinium chloride (CPC) loaded montmorillonite (Mont) and nanoporous silica (NPS) to autopolymerizing resin (resin-Mont, resin-NPS) and evaluated their drug release capacity, antimicrobial capacity, drug reuptake capacity, mechanical strength, and color tone for the devolvement of autopolymerizing resin with antimicrobial properties. As observed, resin-Mont and resin-NPS were capable of the sustained release of CPC for 14 d, and a higher amount of CPC was released compared to that of resin-CPC. Additionally, resin-Mont and resin-NPS could reuptake CPC. Moreover, the antimicrobial studies demonstrated that resin-Mont and resin-NPS could release effective amounts of CPC against <i>Streptococcus mutans</i> for 14 d and 7 d after reuptake, respectively. Compared to resin-CPC, resin-Mont exhibited a higher sustained release of CPC in all periods, both in the initial sustained release and after reuptake. However, the mechanical strength decreased with the addition of Mont and NPS, with a 36% reduction observed in flexural strength for resin-Mont and 25% for resin-NPS. The application of these results to the resin portion of the orthodontic appliances can prevent bacterial growth on the surface, as well as on the interior, of the appliances and mitigate the inflammation of the mucosa. |
| first_indexed | 2024-03-11T08:17:24Z |
| format | Article |
| id | doaj.art-e1795cd67b6e49858920b84ecb286cca |
| institution | Directory Open Access Journal |
| issn | 1999-4923 |
| language | English |
| last_indexed | 2024-03-11T08:17:24Z |
| publishDate | 2023-02-01 |
| publisher | MDPI AG |
| record_format | Article |
| series | Pharmaceutics |
| spelling | doaj.art-e1795cd67b6e49858920b84ecb286cca2023-11-16T22:41:22ZengMDPI AGPharmaceutics1999-49232023-02-0115254410.3390/pharmaceutics15020544Development of Autopolymerizing Resin Material with Antimicrobial Properties Using Montmorillonite and Nanoporous SilicaShuhei Otsubo0Ko Nakanishi1Kakufu Fukukawa2Ryoshun Endo3Seiichiro Yoshida4Aiko Matsumoto5Kumiko Yoshihara6Tsukasa Akasaka7Akira Hasebe8Yasuhiro Yoshida9Yoshiaki Sato10Department of Orthodontics, Faculty of Dental Medicine, Hokkaido University, Kita13, Nishi7, Kita-ku, Sapporo 060-8586, JapanDepartment of Biomaterials and Bioengineering, Faculty of Dental Medicine, Hokkaido University, Kita13, Nishi7, Kita-ku, Sapporo 060-8586, JapanDepartment of Oral Functional Prosthodontics, Faculty of Dental Medicine, Hokkaido University, Kita13, Nishi7, Kita-ku, Sapporo 060-8586, JapanDepartment of Orthodontics, Faculty of Dental Medicine, Hokkaido University, Kita13, Nishi7, Kita-ku, Sapporo 060-8586, JapanIndustrial Research Institute, Industrial Technology and Environment Research Department, Hokkaido Research Organization, Sapporo 060-0819, JapanDepartment of Orthodontics, Faculty of Dental Medicine, Hokkaido University, Kita13, Nishi7, Kita-ku, Sapporo 060-8586, JapanNational Institute of Advanced Industrial Science and Technology (AIST), Health and Medical Research Institute, Takamatsu 761-0395, JapanDepartment of Biomaterials and Bioengineering, Faculty of Dental Medicine, Hokkaido University, Kita13, Nishi7, Kita-ku, Sapporo 060-8586, JapanDepartment of Oral Molecular Microbiology, Faculty of Dental Medicine and Graduate School of Dental Medicine, Hokkaido University, Kita13, Nishi7, Kita-ku, Sapporo 060-8586, JapanDepartment of Biomaterials and Bioengineering, Faculty of Dental Medicine, Hokkaido University, Kita13, Nishi7, Kita-ku, Sapporo 060-8586, JapanDepartment of Orthodontics, Faculty of Dental Medicine, Hokkaido University, Kita13, Nishi7, Kita-ku, Sapporo 060-8586, JapanAlthough autopolymerizing resin offers numerous applications in orthodontic treatment, plaque tends to accumulate between the appliance and the mucosa, which increases the number of microorganisms present. In this study, we added cetylpyridinium chloride (CPC) loaded montmorillonite (Mont) and nanoporous silica (NPS) to autopolymerizing resin (resin-Mont, resin-NPS) and evaluated their drug release capacity, antimicrobial capacity, drug reuptake capacity, mechanical strength, and color tone for the devolvement of autopolymerizing resin with antimicrobial properties. As observed, resin-Mont and resin-NPS were capable of the sustained release of CPC for 14 d, and a higher amount of CPC was released compared to that of resin-CPC. Additionally, resin-Mont and resin-NPS could reuptake CPC. Moreover, the antimicrobial studies demonstrated that resin-Mont and resin-NPS could release effective amounts of CPC against <i>Streptococcus mutans</i> for 14 d and 7 d after reuptake, respectively. Compared to resin-CPC, resin-Mont exhibited a higher sustained release of CPC in all periods, both in the initial sustained release and after reuptake. However, the mechanical strength decreased with the addition of Mont and NPS, with a 36% reduction observed in flexural strength for resin-Mont and 25% for resin-NPS. The application of these results to the resin portion of the orthodontic appliances can prevent bacterial growth on the surface, as well as on the interior, of the appliances and mitigate the inflammation of the mucosa.https://www.mdpi.com/1999-4923/15/2/544orthodontic treatmentmontmorillonitenanoporous silicacetylpyridinium chlorideAutopolymerizing Resin Materialdrug release |
| spellingShingle | Shuhei Otsubo Ko Nakanishi Kakufu Fukukawa Ryoshun Endo Seiichiro Yoshida Aiko Matsumoto Kumiko Yoshihara Tsukasa Akasaka Akira Hasebe Yasuhiro Yoshida Yoshiaki Sato Development of Autopolymerizing Resin Material with Antimicrobial Properties Using Montmorillonite and Nanoporous Silica Pharmaceutics orthodontic treatment montmorillonite nanoporous silica cetylpyridinium chloride Autopolymerizing Resin Material drug release |
| title | Development of Autopolymerizing Resin Material with Antimicrobial Properties Using Montmorillonite and Nanoporous Silica |
| title_full | Development of Autopolymerizing Resin Material with Antimicrobial Properties Using Montmorillonite and Nanoporous Silica |
| title_fullStr | Development of Autopolymerizing Resin Material with Antimicrobial Properties Using Montmorillonite and Nanoporous Silica |
| title_full_unstemmed | Development of Autopolymerizing Resin Material with Antimicrobial Properties Using Montmorillonite and Nanoporous Silica |
| title_short | Development of Autopolymerizing Resin Material with Antimicrobial Properties Using Montmorillonite and Nanoporous Silica |
| title_sort | development of autopolymerizing resin material with antimicrobial properties using montmorillonite and nanoporous silica |
| topic | orthodontic treatment montmorillonite nanoporous silica cetylpyridinium chloride Autopolymerizing Resin Material drug release |
| url | https://www.mdpi.com/1999-4923/15/2/544 |
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