Application of Ozone Related Processes to Mineralize Tetramethyl Ammonium Hydroxide in Aqueous Solution

Tetramethyl ammonium hydroxide (TMAH) is an anisotropic etchant used in the wet etching process of the semiconductor industry and is hard to degrade by biotreatments when it exists in wastewater. This study evaluated the performance of a system combined with ultraviolet, magnetic catalyst (SiO2/Fe3O...

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Hlavní autoři: Chyow-San Chiou, Kai-Jen Chuang, Ya-Fen Lin, Hua-Wei Chen, Chih-Ming Ma
Médium: Článek
Jazyk:English
Vydáno: Hindawi Limited 2013-01-01
Edice:International Journal of Photoenergy
On-line přístup:http://dx.doi.org/10.1155/2013/191742