Application of Ozone Related Processes to Mineralize Tetramethyl Ammonium Hydroxide in Aqueous Solution

Tetramethyl ammonium hydroxide (TMAH) is an anisotropic etchant used in the wet etching process of the semiconductor industry and is hard to degrade by biotreatments when it exists in wastewater. This study evaluated the performance of a system combined with ultraviolet, magnetic catalyst (SiO2/Fe3O...

詳細記述

書誌詳細
主要な著者: Chyow-San Chiou, Kai-Jen Chuang, Ya-Fen Lin, Hua-Wei Chen, Chih-Ming Ma
フォーマット: 論文
言語:English
出版事項: Hindawi Limited 2013-01-01
シリーズ:International Journal of Photoenergy
オンライン・アクセス:http://dx.doi.org/10.1155/2013/191742