Application of Ozone Related Processes to Mineralize Tetramethyl Ammonium Hydroxide in Aqueous Solution

Tetramethyl ammonium hydroxide (TMAH) is an anisotropic etchant used in the wet etching process of the semiconductor industry and is hard to degrade by biotreatments when it exists in wastewater. This study evaluated the performance of a system combined with ultraviolet, magnetic catalyst (SiO2/Fe3O...

Бүрэн тодорхойлолт

Номзүйн дэлгэрэнгүй
Үндсэн зохиолчид: Chyow-San Chiou, Kai-Jen Chuang, Ya-Fen Lin, Hua-Wei Chen, Chih-Ming Ma
Формат: Өгүүллэг
Хэл сонгох:English
Хэвлэсэн: Hindawi Limited 2013-01-01
Цуврал:International Journal of Photoenergy
Онлайн хандалт:http://dx.doi.org/10.1155/2013/191742