Studi Spektroskopi Electron Spin Resonance (Esr) Lapisan Tipis Amorf Silikon Karbon (A-Sic:H) Hasil Deposisi Metode Dc Sputtering

The dangling bond defect density in sputtered amorphous silicon carbon alloys have been studied by electron spin resonance (ESR). The results show that the spin density decreased slightly with increasing methane fl ow rate (CH4). The infl uence of carbon and hydrogen incorporation on g-value reveale...

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Main Author: Rosari Saleh
Format: Article
Language:English
Published: Universitas Indonesia 2002-04-01
Series:Makara Seri Sains
Subjects:
Online Access:http://journal.ui.ac.id/science/article/view/100/96
_version_ 1818753982918557696
author Rosari Saleh
author_facet Rosari Saleh
author_sort Rosari Saleh
collection DOAJ
description The dangling bond defect density in sputtered amorphous silicon carbon alloys have been studied by electron spin resonance (ESR). The results show that the spin density decreased slightly with increasing methane fl ow rate (CH4). The infl uence of carbon and hydrogen incorporation on g-value revealed that for CH4 fl ow rate up to 8 sccm, the ESR signal is dominated by defects characteristic of a-Si:H fi lms and for CH4 fl ow rate higher than 8 sccm the g-value decreased towards those usually found in a-C:H fi lms. Infrared (IR) results suggest that as CH4 fl ow rate increases more carbon and hydrogen is incorporated into the fi lms to form Si-H, Si-C and C-H bonds. A direct relation between the IR results and the defect density and g-value is observed.
first_indexed 2024-12-18T05:16:01Z
format Article
id doaj.art-e225585f13174a6eb786859bfb2e84eb
institution Directory Open Access Journal
issn 1693-6671
language English
last_indexed 2024-12-18T05:16:01Z
publishDate 2002-04-01
publisher Universitas Indonesia
record_format Article
series Makara Seri Sains
spelling doaj.art-e225585f13174a6eb786859bfb2e84eb2022-12-21T21:19:47ZengUniversitas IndonesiaMakara Seri Sains1693-66712002-04-010613135Studi Spektroskopi Electron Spin Resonance (Esr) Lapisan Tipis Amorf Silikon Karbon (A-Sic:H) Hasil Deposisi Metode Dc SputteringRosari SalehThe dangling bond defect density in sputtered amorphous silicon carbon alloys have been studied by electron spin resonance (ESR). The results show that the spin density decreased slightly with increasing methane fl ow rate (CH4). The infl uence of carbon and hydrogen incorporation on g-value revealed that for CH4 fl ow rate up to 8 sccm, the ESR signal is dominated by defects characteristic of a-Si:H fi lms and for CH4 fl ow rate higher than 8 sccm the g-value decreased towards those usually found in a-C:H fi lms. Infrared (IR) results suggest that as CH4 fl ow rate increases more carbon and hydrogen is incorporated into the fi lms to form Si-H, Si-C and C-H bonds. A direct relation between the IR results and the defect density and g-value is observed.http://journal.ui.ac.id/science/article/view/100/96Electron spin resonancesilicon carbondefect densitysputtering
spellingShingle Rosari Saleh
Studi Spektroskopi Electron Spin Resonance (Esr) Lapisan Tipis Amorf Silikon Karbon (A-Sic:H) Hasil Deposisi Metode Dc Sputtering
Makara Seri Sains
Electron spin resonance
silicon carbon
defect density
sputtering
title Studi Spektroskopi Electron Spin Resonance (Esr) Lapisan Tipis Amorf Silikon Karbon (A-Sic:H) Hasil Deposisi Metode Dc Sputtering
title_full Studi Spektroskopi Electron Spin Resonance (Esr) Lapisan Tipis Amorf Silikon Karbon (A-Sic:H) Hasil Deposisi Metode Dc Sputtering
title_fullStr Studi Spektroskopi Electron Spin Resonance (Esr) Lapisan Tipis Amorf Silikon Karbon (A-Sic:H) Hasil Deposisi Metode Dc Sputtering
title_full_unstemmed Studi Spektroskopi Electron Spin Resonance (Esr) Lapisan Tipis Amorf Silikon Karbon (A-Sic:H) Hasil Deposisi Metode Dc Sputtering
title_short Studi Spektroskopi Electron Spin Resonance (Esr) Lapisan Tipis Amorf Silikon Karbon (A-Sic:H) Hasil Deposisi Metode Dc Sputtering
title_sort studi spektroskopi electron spin resonance esr lapisan tipis amorf silikon karbon a sic h hasil deposisi metode dc sputtering
topic Electron spin resonance
silicon carbon
defect density
sputtering
url http://journal.ui.ac.id/science/article/view/100/96
work_keys_str_mv AT rosarisaleh studispektroskopielectronspinresonanceesrlapisantipisamorfsilikonkarbonasichhasildeposisimetodedcsputtering