Dominant acceptors in Li doped, magnetron deposited Cu2O films
Cu _2 O films deposited by reactive magnetron sputtering with varying Li concentrations have been investigated by a combination of temperature-dependent Hall effect measurement and thermal admittance spectroscopy. As measured by secondary ion mass spectrometry, Li concentrations up to 5 × 10 ^20 Li/...
| Main Authors: | , , , |
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| Format: | Article |
| Language: | English |
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IOP Publishing
2021-01-01
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| Series: | Materials Research Express |
| Subjects: | |
| Online Access: | https://doi.org/10.1088/2053-1591/ac3e24 |
| _version_ | 1797746704649289728 |
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| author | M Nyborg K Karlsen K Bergum E Monakhov |
| author_facet | M Nyborg K Karlsen K Bergum E Monakhov |
| author_sort | M Nyborg |
| collection | DOAJ |
| description | Cu _2 O films deposited by reactive magnetron sputtering with varying Li concentrations have been investigated by a combination of temperature-dependent Hall effect measurement and thermal admittance spectroscopy. As measured by secondary ion mass spectrometry, Li concentrations up to 5 × 10 ^20 Li/cm ^3 have been achieved. Li doping significantly alters the electrical properties of Cu _2 O and increases hole concentration at room temperature for higher Li concentrations. Moreover, the apparent activation energy for the dominant acceptors decreases from around 0.2 eV for undoped or lightly doped Cu _2 O down to as low as 0.05 eV for higher Li concentrations. |
| first_indexed | 2024-03-12T15:41:39Z |
| format | Article |
| id | doaj.art-e365a8c4308645dd8f4041a234686487 |
| institution | Directory Open Access Journal |
| issn | 2053-1591 |
| language | English |
| last_indexed | 2024-03-12T15:41:39Z |
| publishDate | 2021-01-01 |
| publisher | IOP Publishing |
| record_format | Article |
| series | Materials Research Express |
| spelling | doaj.art-e365a8c4308645dd8f4041a2346864872023-08-09T15:59:25ZengIOP PublishingMaterials Research Express2053-15912021-01-0181212590310.1088/2053-1591/ac3e24Dominant acceptors in Li doped, magnetron deposited Cu2O filmsM Nyborg0https://orcid.org/0000-0002-2787-9073K Karlsen1https://orcid.org/0000-0002-0904-2480K Bergum2https://orcid.org/0000-0002-4093-521XE Monakhov3https://orcid.org/0000-0002-7015-3358Physics Department/Centre for Materials Science and Nanotechnology, University of Oslo , PO Box 1048 Blindern, Oslo N-0316, NorwayPhysics Department/Centre for Materials Science and Nanotechnology, University of Oslo , PO Box 1048 Blindern, Oslo N-0316, NorwayPhysics Department/Centre for Materials Science and Nanotechnology, University of Oslo , PO Box 1048 Blindern, Oslo N-0316, NorwayPhysics Department/Centre for Materials Science and Nanotechnology, University of Oslo , PO Box 1048 Blindern, Oslo N-0316, NorwayCu _2 O films deposited by reactive magnetron sputtering with varying Li concentrations have been investigated by a combination of temperature-dependent Hall effect measurement and thermal admittance spectroscopy. As measured by secondary ion mass spectrometry, Li concentrations up to 5 × 10 ^20 Li/cm ^3 have been achieved. Li doping significantly alters the electrical properties of Cu _2 O and increases hole concentration at room temperature for higher Li concentrations. Moreover, the apparent activation energy for the dominant acceptors decreases from around 0.2 eV for undoped or lightly doped Cu _2 O down to as low as 0.05 eV for higher Li concentrations.https://doi.org/10.1088/2053-1591/ac3e24cuprous oxidedopinglithiumcarrier transportmagnetron sputtering |
| spellingShingle | M Nyborg K Karlsen K Bergum E Monakhov Dominant acceptors in Li doped, magnetron deposited Cu2O films Materials Research Express cuprous oxide doping lithium carrier transport magnetron sputtering |
| title | Dominant acceptors in Li doped, magnetron deposited Cu2O films |
| title_full | Dominant acceptors in Li doped, magnetron deposited Cu2O films |
| title_fullStr | Dominant acceptors in Li doped, magnetron deposited Cu2O films |
| title_full_unstemmed | Dominant acceptors in Li doped, magnetron deposited Cu2O films |
| title_short | Dominant acceptors in Li doped, magnetron deposited Cu2O films |
| title_sort | dominant acceptors in li doped magnetron deposited cu2o films |
| topic | cuprous oxide doping lithium carrier transport magnetron sputtering |
| url | https://doi.org/10.1088/2053-1591/ac3e24 |
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