Development of n-Type, Passivating Nanocrystalline Silicon Oxide Films via Plasma-Enhanced Chemical Vapor Deposition

Development of n-Type, Passivating Nanocrystalline Silicon Oxide Films via Plasma-Enhanced Chemical Vapor Deposition

Nanocrystalline silicon oxide (nc-SiOx:H) is a multipurpose material with varied applications in solar cells as a transparent front contact, intermediate reflector, back reflector layer, and even tunnel layer for passivating contacts, owing to the easy tailoring of its optical properties. In this wo...

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Bibliographic Details
Main Authors: Gurleen Kaur, Antonio J. Olivares, Pere Roca i Cabarrocas
Format: Article
Language:English
Published: MDPI AG 2024-03-01
Series:Solar
Subjects:
nanocrystalline silicon oxide
nc-SiOx:H
n-type
surface passivation
amorphous silicon
PECVD
Online Access:https://www.mdpi.com/2673-9941/4/1/7

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