On the Oxygen Transport Mechanism in Titanium Thin Films under Irradiation by Molecular Water Ions
<p>The behavior of oxygen atoms in (0.5<sub> </sub>–<sub> </sub>1.0) mm thick Ti films is investigated under high-flux, low-energy molecular water ion irradiation. The anomalously deep penetration of oxygen without formation of new compounds observable by XRD has been r...
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| Format: | Article |
| Language: | English |
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Kaunas University of Technology
2013-03-01
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| Series: | Medžiagotyra |
| Subjects: | |
| Online Access: | http://matsc.ktu.lt/index.php/MatSc/article/view/3822 |
| _version_ | 1818303201156268032 |
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| author | Simona TUČKUTĖ Liudas PRANEVIČIUS Liudvikas PRANEVIČIUS Marius URBONAVIČIUS |
| author_facet | Simona TUČKUTĖ Liudas PRANEVIČIUS Liudvikas PRANEVIČIUS Marius URBONAVIČIUS |
| author_sort | Simona TUČKUTĖ |
| collection | DOAJ |
| description | <p>The behavior of oxygen atoms in (0.5<sub> </sub>–<sub> </sub>1.0) mm thick Ti films is investigated under high-flux, low-energy molecular water ion irradiation. The anomalously deep penetration of oxygen without formation of new compounds observable by XRD has been registered after 10 min of irradiation at room temperature using Auger Electron spectroscopy analysis.</p> The mechanism driving oxygen atoms from the surface into the bulk is discussed. It is based on the results of experimental studies of surface topography and assumption that the surface energy increases under ion irradiation, and relaxation processes minimizing the surface energy initiate the atomic redistribution on the surface and in the bulk. Two processes minimizing the surface free energy are considered: (i) the mixing of atoms on the surface, and (ii) the annihilation of surface vacancies by the atoms transported from the bulk to the surface.<p>DOI: <a href="http://dx.doi.org/10.5755/j01.ms.19.1.3822">http://dx.doi.org/10.5755/j01.ms.19.1.3822</a></p> |
| first_indexed | 2024-12-13T05:51:02Z |
| format | Article |
| id | doaj.art-e48d6193c11b424d8f79813ebe522cdb |
| institution | Directory Open Access Journal |
| issn | 1392-1320 2029-7289 |
| language | English |
| last_indexed | 2024-12-13T05:51:02Z |
| publishDate | 2013-03-01 |
| publisher | Kaunas University of Technology |
| record_format | Article |
| series | Medžiagotyra |
| spelling | doaj.art-e48d6193c11b424d8f79813ebe522cdb2022-12-21T23:57:32ZengKaunas University of TechnologyMedžiagotyra1392-13202029-72892013-03-01191343710.5755/j01.ms.19.1.38222056On the Oxygen Transport Mechanism in Titanium Thin Films under Irradiation by Molecular Water IonsSimona TUČKUTĖ0Liudas PRANEVIČIUS1Liudvikas PRANEVIČIUS2Marius URBONAVIČIUS3Vytautas Magnus University, Lithuanian Energy InstituteVytautas Magnus UniversityVytautas Magnus UniversityVytautas Magnus University<p>The behavior of oxygen atoms in (0.5<sub> </sub>–<sub> </sub>1.0) mm thick Ti films is investigated under high-flux, low-energy molecular water ion irradiation. The anomalously deep penetration of oxygen without formation of new compounds observable by XRD has been registered after 10 min of irradiation at room temperature using Auger Electron spectroscopy analysis.</p> The mechanism driving oxygen atoms from the surface into the bulk is discussed. It is based on the results of experimental studies of surface topography and assumption that the surface energy increases under ion irradiation, and relaxation processes minimizing the surface energy initiate the atomic redistribution on the surface and in the bulk. Two processes minimizing the surface free energy are considered: (i) the mixing of atoms on the surface, and (ii) the annihilation of surface vacancies by the atoms transported from the bulk to the surface.<p>DOI: <a href="http://dx.doi.org/10.5755/j01.ms.19.1.3822">http://dx.doi.org/10.5755/j01.ms.19.1.3822</a></p>http://matsc.ktu.lt/index.php/MatSc/article/view/3822hydrogenwater vaporplasmaion implantation |
| spellingShingle | Simona TUČKUTĖ Liudas PRANEVIČIUS Liudvikas PRANEVIČIUS Marius URBONAVIČIUS On the Oxygen Transport Mechanism in Titanium Thin Films under Irradiation by Molecular Water Ions Medžiagotyra hydrogen water vapor plasma ion implantation |
| title | On the Oxygen Transport Mechanism in Titanium Thin Films under Irradiation by Molecular Water Ions |
| title_full | On the Oxygen Transport Mechanism in Titanium Thin Films under Irradiation by Molecular Water Ions |
| title_fullStr | On the Oxygen Transport Mechanism in Titanium Thin Films under Irradiation by Molecular Water Ions |
| title_full_unstemmed | On the Oxygen Transport Mechanism in Titanium Thin Films under Irradiation by Molecular Water Ions |
| title_short | On the Oxygen Transport Mechanism in Titanium Thin Films under Irradiation by Molecular Water Ions |
| title_sort | on the oxygen transport mechanism in titanium thin films under irradiation by molecular water ions |
| topic | hydrogen water vapor plasma ion implantation |
| url | http://matsc.ktu.lt/index.php/MatSc/article/view/3822 |
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