Optimal design of junctionless double gate vertical MOSFET using hybrid Taguchi-GRA with ANN prediction

Random parameter variations have been an influential factor that deciding the performance of a metal-oxide-semiconductor field effect transistor (MOSFET), especially in nano-scale regime. Thus, controlling the variation of those parameters becomes extremely crucial in order to attain an acceptable p...

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Main Authors: K. E. Kaharudin, F. Salehuddin, A. S. M. Zain, Ameer F. Roslan
Format: Article
Language:English
Published: Universiti Malaysia Pahang Publishing 2019-09-01
Series:Journal of Mechanical Engineering and Sciences
Subjects:
Online Access:https://journal.ump.edu.my/jmes/article/view/441
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author K. E. Kaharudin
F. Salehuddin
A. S. M. Zain
Ameer F. Roslan
author_facet K. E. Kaharudin
F. Salehuddin
A. S. M. Zain
Ameer F. Roslan
author_sort K. E. Kaharudin
collection DOAJ
description Random parameter variations have been an influential factor that deciding the performance of a metal-oxide-semiconductor field effect transistor (MOSFET), especially in nano-scale regime. Thus, controlling the variation of those parameters becomes extremely crucial in order to attain an acceptable performance of an ultra-small MOSFET. This paper proposes an approach to optimally design a n-type junctionless double-gate vertical MOSFET (n-JLDGVM) via hybrid Taguchi-grey relational analysis (GRA) with artificial neural networks (ANN) prediction. The device is designed using a combination of 2-D simulation tools (Silvaco) and hybrid Taguchi-GRA with a well-trained ANN prediction. The investigated device parameters consist of channel length (Lch), pillar thickness (Tp), channel doping (Nch) and source/drain doping (Nsd). The optimized design parameters of the device demonstrate a tolerable magnitude of on-state current (ION), off-state current (IOFF), on-off ratio, transconductance (gm), cut-off frequency (fT) and maximum oscillation frequency (fmax), measured at 2344.9 µA/µm, 2.53 pA/µm, 927 x 106, 4.78 mS/µm, 121.5 GHz and 2469 GHz respectively.
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spelling doaj.art-e4dbb47b49ee40b7a7652575d0415b052023-09-03T14:43:48ZengUniversiti Malaysia Pahang PublishingJournal of Mechanical Engineering and Sciences2289-46592231-83802019-09-011335455547910.15282/jmes.13.3.2019.16.0442Optimal design of junctionless double gate vertical MOSFET using hybrid Taguchi-GRA with ANN predictionK. E. Kaharudin0F. Salehuddin1A. S. M. Zain2Ameer F. Roslan3MiNE, CeTRI, Faculty of Electronics and Computer Engineering (FKEKK), Universiti Teknikal Malaysia Melaka (UTeM), Hang Tuah Jaya, 76100 Durian Tunggal, Melaka, Malaysia, Phone: +6062702361; Fax: +6062701045MiNE, CeTRI, Faculty of Electronics and Computer Engineering (FKEKK), Universiti Teknikal Malaysia Melaka (UTeM), Hang Tuah Jaya, 76100 Durian Tunggal, Melaka, Malaysia, Phone: +6062702361; Fax: +6062701045MiNE, CeTRI, Faculty of Electronics and Computer Engineering (FKEKK), Universiti Teknikal Malaysia Melaka (UTeM), Hang Tuah Jaya, 76100 Durian Tunggal, Melaka, Malaysia, Phone: +6062702361; Fax: +6062701045MiNE, CeTRI, Faculty of Electronics and Computer Engineering (FKEKK), Universiti Teknikal Malaysia Melaka (UTeM), Hang Tuah Jaya, 76100 Durian Tunggal, Melaka, Malaysia, Phone: +6062702361; Fax: +6062701045Random parameter variations have been an influential factor that deciding the performance of a metal-oxide-semiconductor field effect transistor (MOSFET), especially in nano-scale regime. Thus, controlling the variation of those parameters becomes extremely crucial in order to attain an acceptable performance of an ultra-small MOSFET. This paper proposes an approach to optimally design a n-type junctionless double-gate vertical MOSFET (n-JLDGVM) via hybrid Taguchi-grey relational analysis (GRA) with artificial neural networks (ANN) prediction. The device is designed using a combination of 2-D simulation tools (Silvaco) and hybrid Taguchi-GRA with a well-trained ANN prediction. The investigated device parameters consist of channel length (Lch), pillar thickness (Tp), channel doping (Nch) and source/drain doping (Nsd). The optimized design parameters of the device demonstrate a tolerable magnitude of on-state current (ION), off-state current (IOFF), on-off ratio, transconductance (gm), cut-off frequency (fT) and maximum oscillation frequency (fmax), measured at 2344.9 µA/µm, 2.53 pA/µm, 927 x 106, 4.78 mS/µm, 121.5 GHz and 2469 GHz respectively.https://journal.ump.edu.my/jmes/article/view/441channel dopingchannel lengthpillar thicknesssource/drain doping
spellingShingle K. E. Kaharudin
F. Salehuddin
A. S. M. Zain
Ameer F. Roslan
Optimal design of junctionless double gate vertical MOSFET using hybrid Taguchi-GRA with ANN prediction
Journal of Mechanical Engineering and Sciences
channel doping
channel length
pillar thickness
source/drain doping
title Optimal design of junctionless double gate vertical MOSFET using hybrid Taguchi-GRA with ANN prediction
title_full Optimal design of junctionless double gate vertical MOSFET using hybrid Taguchi-GRA with ANN prediction
title_fullStr Optimal design of junctionless double gate vertical MOSFET using hybrid Taguchi-GRA with ANN prediction
title_full_unstemmed Optimal design of junctionless double gate vertical MOSFET using hybrid Taguchi-GRA with ANN prediction
title_short Optimal design of junctionless double gate vertical MOSFET using hybrid Taguchi-GRA with ANN prediction
title_sort optimal design of junctionless double gate vertical mosfet using hybrid taguchi gra with ann prediction
topic channel doping
channel length
pillar thickness
source/drain doping
url https://journal.ump.edu.my/jmes/article/view/441
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AT fsalehuddin optimaldesignofjunctionlessdoublegateverticalmosfetusinghybridtaguchigrawithannprediction
AT asmzain optimaldesignofjunctionlessdoublegateverticalmosfetusinghybridtaguchigrawithannprediction
AT ameerfroslan optimaldesignofjunctionlessdoublegateverticalmosfetusinghybridtaguchigrawithannprediction