| Summary: | Recently, tunnel field-effect transistors (TFETs) have been regarded as next-generation ultra-low-power semi-conductor devices. To commercialize the TFETs, however, it is necessary to improve an on-state current caused by tunnel-junction resistance and to suppress a leakage current from ambipolar current (<i>I</i><sub>AMB</sub>). In this paper, we suggest a novel TFET which features double gate, vertical, and trapezoid isosceles channel structure to solve the above-mentioned technical issues. The device design is optimized by examining its electrical characteristics with the help of technology computer-aided design (TCAD) simulation. As a result, double-gate isosceles trapezoid (DGIT) TFET shows a much better performance than the conventional TFET in terms of ON-state current (<i>I</i><sub>ON</sub>), <i>I</i><sub>AMB</sub>, and gate-to-drain capacitance (<i>C</i><sub>GD</sub>). It is confirmed that an inverter composed of DGIT-TFETs can operate with less than 1 ns intrinsic delay time and negligible voltage overshoot.
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