Influence of the microstructure on the electrochemical properties of Al-Cr-N coatings deposited by co-sputtering method from a Cr-Al binary target

Influence of the microstructure on the electrochemical properties of Al-Cr-N coatings deposited by co-sputtering method from a Cr-Al binary target

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In the present paper, aluminum chromium nitride (Al-Cr-N) films were deposited onto AISI H13 steel substrates by a reactive d.c magnetron co-sputtering system in an atmosphere of Ar/N2 (90/10) gas mixture from a binary target composed of chromium (99.95%) and aluminum (99.99%). Different powers (40,...

Ausführliche Beschreibung

Bibliographische Detailangaben
Hauptverfasser: Oscar Mauricio Sánchez Quintero, Willian Aperador Chaparro, Leonid Ipaz, Jaime Eduardo Sánchez Barco, Francisco Espinoza Beltrán, Gustavo Zambrano
Format: Artikel
Sprache:English
Veröffentlicht: Associação Brasileira de Metalurgia e Materiais (ABM); Associação Brasileira de Cerâmica (ABC); Associação Brasileira de Polímeros (ABPol) 2012-01-01
Schriftenreihe:Materials Research
Schlagworte:
thin films
electrochemical properties
co-sputtering
aluminum chromium nitride
Online Zugang:http://www.scielo.br/scielo.php?script=sci_arttext&pid=S1516-14392012005000171

Online

http://www.scielo.br/scielo.php?script=sci_arttext&pid=S1516-14392012005000171

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