Structural,Morphology and PL Properties of ZnO Film Deposition on Porous Silicon

Structural,Morphology and PL Properties of ZnO Film Deposition on Porous Silicon

ZnO thin film was deposited on glass and porous silicon by spray pyrolysis technology with fixed parameters consist (substrate temperature 400Co, deposition rate 100nm/min), and the measurements of structural (XRD), morphology (AFM) and photoluminesces (PL) refer to good growth of ZnO after using po...

Full description

Bibliographic Details
Main Authors: Uday Muhsin Nayef, Mohammed Waleed Muayad
Format: Article
Language:English
Published: Unviversity of Technology- Iraq 2014-06-01
Series:Engineering and Technology Journal
Subjects:
porous silicon
zno films
xrd
afm
Online Access:https://etj.uotechnology.edu.iq/article_105264_387bf7ee062740fec5e29e22c3b296f9.pdf

Similar Items

Similar Items