Nanostructured Titanium Film Deposited by Pulsed Plasma Magnetron Sputtering (Pdms) on a High Voltage Ceramic Insulator for Outdoor Use
In this study, the cold plasma technique was used to produce nanometric titanium films with hydrophobic and anti-fouling properties. The films where deposited on porcelain electrical insulators surfaces to minimize the effects of leakage current. The magnetron sputtering technique was used with a ta...
| Main Authors: | , , , , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
Associação Brasileira de Metalurgia e Materiais (ABM); Associação Brasileira de Cerâmica (ABC); Associação Brasileira de Polímeros (ABPol)
2015-08-01
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| Series: | Materials Research |
| Subjects: | |
| Online Access: | http://www.scielo.br/scielo.php?script=sci_arttext&pid=S1516-14392015000400853&tlng=en |
| _version_ | 1819284973549518848 |
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| author | Kleber Franke Portella Priscilla Mengarda Mariana d'Orey Gaivão Portella Bragança Sebastião Ribeiro Júnior Jose Sergio Santos de Melo Dailton Pedreira Cerqueira Sidnei Antonio Pianaro Maurício Marlon Mazur |
| author_facet | Kleber Franke Portella Priscilla Mengarda Mariana d'Orey Gaivão Portella Bragança Sebastião Ribeiro Júnior Jose Sergio Santos de Melo Dailton Pedreira Cerqueira Sidnei Antonio Pianaro Maurício Marlon Mazur |
| author_sort | Kleber Franke Portella |
| collection | DOAJ |
| description | In this study, the cold plasma technique was used to produce nanometric titanium films with hydrophobic and anti-fouling properties. The films where deposited on porcelain electrical insulators surfaces to minimize the effects of leakage current. The magnetron sputtering technique was used with a target of pure titanium sheet, and argon as the ionization gas. The deposited films present an average thickness of 58 to 350 nm. After coating the insulators, the assays performed indicated a greater degree of hydrophobicity and maintenance of leakage current after exposure to salt spray. Lower leakage current values were observed in both natural and saline environments compared with the uncoated device. |
| first_indexed | 2024-12-24T01:55:53Z |
| format | Article |
| id | doaj.art-e702f6f38bcb4e298ad850858a863330 |
| institution | Directory Open Access Journal |
| issn | 1516-1439 |
| language | English |
| last_indexed | 2024-12-24T01:55:53Z |
| publishDate | 2015-08-01 |
| publisher | Associação Brasileira de Metalurgia e Materiais (ABM); Associação Brasileira de Cerâmica (ABC); Associação Brasileira de Polímeros (ABPol) |
| record_format | Article |
| series | Materials Research |
| spelling | doaj.art-e702f6f38bcb4e298ad850858a8633302022-12-21T17:21:35ZengAssociação Brasileira de Metalurgia e Materiais (ABM); Associação Brasileira de Cerâmica (ABC); Associação Brasileira de Polímeros (ABPol)Materials Research1516-14392015-08-0118485385910.1590/1516-1439.016015Nanostructured Titanium Film Deposited by Pulsed Plasma Magnetron Sputtering (Pdms) on a High Voltage Ceramic Insulator for Outdoor UseKleber Franke PortellaPriscilla MengardaMariana d'Orey Gaivão Portella BragançaSebastião Ribeiro JúniorJose Sergio Santos de MeloDailton Pedreira CerqueiraSidnei Antonio PianaroMaurício Marlon MazurIn this study, the cold plasma technique was used to produce nanometric titanium films with hydrophobic and anti-fouling properties. The films where deposited on porcelain electrical insulators surfaces to minimize the effects of leakage current. The magnetron sputtering technique was used with a target of pure titanium sheet, and argon as the ionization gas. The deposited films present an average thickness of 58 to 350 nm. After coating the insulators, the assays performed indicated a greater degree of hydrophobicity and maintenance of leakage current after exposure to salt spray. Lower leakage current values were observed in both natural and saline environments compared with the uncoated device.http://www.scielo.br/scielo.php?script=sci_arttext&pid=S1516-14392015000400853&tlng=ennanometric coatingelectrical insulatorhydrophobicitycold plasmatitanium |
| spellingShingle | Kleber Franke Portella Priscilla Mengarda Mariana d'Orey Gaivão Portella Bragança Sebastião Ribeiro Júnior Jose Sergio Santos de Melo Dailton Pedreira Cerqueira Sidnei Antonio Pianaro Maurício Marlon Mazur Nanostructured Titanium Film Deposited by Pulsed Plasma Magnetron Sputtering (Pdms) on a High Voltage Ceramic Insulator for Outdoor Use Materials Research nanometric coating electrical insulator hydrophobicity cold plasma titanium |
| title | Nanostructured Titanium Film Deposited by Pulsed Plasma Magnetron Sputtering (Pdms) on a High Voltage Ceramic Insulator for Outdoor Use |
| title_full | Nanostructured Titanium Film Deposited by Pulsed Plasma Magnetron Sputtering (Pdms) on a High Voltage Ceramic Insulator for Outdoor Use |
| title_fullStr | Nanostructured Titanium Film Deposited by Pulsed Plasma Magnetron Sputtering (Pdms) on a High Voltage Ceramic Insulator for Outdoor Use |
| title_full_unstemmed | Nanostructured Titanium Film Deposited by Pulsed Plasma Magnetron Sputtering (Pdms) on a High Voltage Ceramic Insulator for Outdoor Use |
| title_short | Nanostructured Titanium Film Deposited by Pulsed Plasma Magnetron Sputtering (Pdms) on a High Voltage Ceramic Insulator for Outdoor Use |
| title_sort | nanostructured titanium film deposited by pulsed plasma magnetron sputtering pdms on a high voltage ceramic insulator for outdoor use |
| topic | nanometric coating electrical insulator hydrophobicity cold plasma titanium |
| url | http://www.scielo.br/scielo.php?script=sci_arttext&pid=S1516-14392015000400853&tlng=en |
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