Determination of Reactive RF-Sputtering Parameters for Fabrication of SiOx Films With Specified Refractive Index, for Highly Reflective SiOx Distributed Bragg Reflector
Fabricating materials with specific refractive indices, which do not naturally exist in the nature, has always been an issue. This paper presents a method for fabricating SiO<sub>x</sub> films with specified refractive index. It is well known that the refractive index of reactively sputt...
Main Authors: | Elnaz Afsharipour, Byoungyoul Park, Cyrus Shafai |
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Format: | Article |
Language: | English |
Published: |
IEEE
2017-01-01
|
Series: | IEEE Photonics Journal |
Subjects: | |
Online Access: | https://ieeexplore.ieee.org/document/7809096/ |
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