An open source three-mirror laser scanning holographic two-photon lithography system
Two-photon polymerization is a widely adopted technique for direct fabrication of 3D and 2D structures with sub-diffraction-limit features. Here we present an open-hardware, open-software custom design for a holographic multibeam two-photon polymerization system based on a phase-only spatial light m...
| Main Authors: | , , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
Public Library of Science (PLoS)
2022-01-01
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| Series: | PLoS ONE |
| Online Access: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9012383/?tool=EBI |
| _version_ | 1818025345092157440 |
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| author | Marco Pisanello Di Zheng Antonio Balena Filippo Pisano Massimo De Vittorio Ferruccio Pisanello |
| author_facet | Marco Pisanello Di Zheng Antonio Balena Filippo Pisano Massimo De Vittorio Ferruccio Pisanello |
| author_sort | Marco Pisanello |
| collection | DOAJ |
| description | Two-photon polymerization is a widely adopted technique for direct fabrication of 3D and 2D structures with sub-diffraction-limit features. Here we present an open-hardware, open-software custom design for a holographic multibeam two-photon polymerization system based on a phase-only spatial light modulator and a three-mirror scanhead. The use of three reflective surfaces, two of which scanning the phase-modulated image along the same axis, allows to overcome the loss of virtual conjugation within the large galvanometric mirrors pair needed to accommodate the holographic projection. This extends the writing field of view among which the hologram can be employed for multi-beam two-photon polymerization by a factor of ~2 on one axis (i.e. from ~200μm to ~400μm), with a voxel size of ~250nm × ~1050nm (lateral × axial size), and writing speed of three simultaneous beams of 2000 voxels/s, making our system a powerful and reliable tool for advanced micro and nano-fabrications on large area. |
| first_indexed | 2024-12-10T04:14:38Z |
| format | Article |
| id | doaj.art-e7a6642448b04da790aefb643f7f0b7c |
| institution | Directory Open Access Journal |
| issn | 1932-6203 |
| language | English |
| last_indexed | 2024-12-10T04:14:38Z |
| publishDate | 2022-01-01 |
| publisher | Public Library of Science (PLoS) |
| record_format | Article |
| series | PLoS ONE |
| spelling | doaj.art-e7a6642448b04da790aefb643f7f0b7c2022-12-22T02:02:38ZengPublic Library of Science (PLoS)PLoS ONE1932-62032022-01-01174An open source three-mirror laser scanning holographic two-photon lithography systemMarco PisanelloDi ZhengAntonio BalenaFilippo PisanoMassimo De VittorioFerruccio PisanelloTwo-photon polymerization is a widely adopted technique for direct fabrication of 3D and 2D structures with sub-diffraction-limit features. Here we present an open-hardware, open-software custom design for a holographic multibeam two-photon polymerization system based on a phase-only spatial light modulator and a three-mirror scanhead. The use of three reflective surfaces, two of which scanning the phase-modulated image along the same axis, allows to overcome the loss of virtual conjugation within the large galvanometric mirrors pair needed to accommodate the holographic projection. This extends the writing field of view among which the hologram can be employed for multi-beam two-photon polymerization by a factor of ~2 on one axis (i.e. from ~200μm to ~400μm), with a voxel size of ~250nm × ~1050nm (lateral × axial size), and writing speed of three simultaneous beams of 2000 voxels/s, making our system a powerful and reliable tool for advanced micro and nano-fabrications on large area.https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9012383/?tool=EBI |
| spellingShingle | Marco Pisanello Di Zheng Antonio Balena Filippo Pisano Massimo De Vittorio Ferruccio Pisanello An open source three-mirror laser scanning holographic two-photon lithography system PLoS ONE |
| title | An open source three-mirror laser scanning holographic two-photon lithography system |
| title_full | An open source three-mirror laser scanning holographic two-photon lithography system |
| title_fullStr | An open source three-mirror laser scanning holographic two-photon lithography system |
| title_full_unstemmed | An open source three-mirror laser scanning holographic two-photon lithography system |
| title_short | An open source three-mirror laser scanning holographic two-photon lithography system |
| title_sort | open source three mirror laser scanning holographic two photon lithography system |
| url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9012383/?tool=EBI |
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