Rapid thermal oxidation of copper nanostructure thin film for solar cell fabrication

In the present work is the deposition of copper oxide using the pulsed laser deposition technique using Reactive Pulsed Laser as a Deposition technique (RPLD), 1.064μm, 7 nsec Q-switch Nd-YAG laser with 400 mJ/cm2 laser energy’s has been used to ablated high purity cupper target and deposited on th...

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Main Author: Makram A. Fakhri
Format: Article
Language:English
Published: University of Baghdad 2019-02-01
Series:Iraqi Journal of Physics
Subjects:
Online Access:https://ijp.uobaghdad.edu.iq/index.php/physics/article/view/265
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author Makram A. Fakhri
author_facet Makram A. Fakhri
author_sort Makram A. Fakhri
collection DOAJ
description In the present work is the deposition of copper oxide using the pulsed laser deposition technique using Reactive Pulsed Laser as a Deposition technique (RPLD), 1.064μm, 7 nsec Q-switch Nd-YAG laser with 400 mJ/cm2 laser energy’s has been used to ablated high purity cupper target and deposited on the porous silicon substrates recorded and study the effect of rapid thermal annealing on the structural characteristics, morphological, electrical characteristics and properties of the solar cell. Results of AFM likelihood of improved absorption, thereby reducing the reflection compared with crystalline silicon surface. The results showed the characteristics of the solar cell and a clear improvement in the efficiency of the solar cell in the case of copper deposition or not.
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spelling doaj.art-e8d11560c7624bf989f73ddbcdcce9282023-03-14T05:26:24ZengUniversity of BaghdadIraqi Journal of Physics2070-40032664-55482019-02-01132710.30723/ijp.v13i27.265Rapid thermal oxidation of copper nanostructure thin film for solar cell fabricationMakram A. Fakhri In the present work is the deposition of copper oxide using the pulsed laser deposition technique using Reactive Pulsed Laser as a Deposition technique (RPLD), 1.064μm, 7 nsec Q-switch Nd-YAG laser with 400 mJ/cm2 laser energy’s has been used to ablated high purity cupper target and deposited on the porous silicon substrates recorded and study the effect of rapid thermal annealing on the structural characteristics, morphological, electrical characteristics and properties of the solar cell. Results of AFM likelihood of improved absorption, thereby reducing the reflection compared with crystalline silicon surface. The results showed the characteristics of the solar cell and a clear improvement in the efficiency of the solar cell in the case of copper deposition or not. https://ijp.uobaghdad.edu.iq/index.php/physics/article/view/265PLD, Cu2O, Surface morphology, Solar cell properties.
spellingShingle Makram A. Fakhri
Rapid thermal oxidation of copper nanostructure thin film for solar cell fabrication
Iraqi Journal of Physics
PLD, Cu2O, Surface morphology, Solar cell properties.
title Rapid thermal oxidation of copper nanostructure thin film for solar cell fabrication
title_full Rapid thermal oxidation of copper nanostructure thin film for solar cell fabrication
title_fullStr Rapid thermal oxidation of copper nanostructure thin film for solar cell fabrication
title_full_unstemmed Rapid thermal oxidation of copper nanostructure thin film for solar cell fabrication
title_short Rapid thermal oxidation of copper nanostructure thin film for solar cell fabrication
title_sort rapid thermal oxidation of copper nanostructure thin film for solar cell fabrication
topic PLD, Cu2O, Surface morphology, Solar cell properties.
url https://ijp.uobaghdad.edu.iq/index.php/physics/article/view/265
work_keys_str_mv AT makramafakhri rapidthermaloxidationofcoppernanostructurethinfilmforsolarcellfabrication