Ferroelectric switching in epitaxial GeTe films

In this paper, using a resonance-enhanced piezoresponse force microscopy approach supported by density functional theory computer simulations, we have demonstrated the ferroelectric switching in epitaxial GeTe films. It has been shown that in films with thickness on the order of several nanometers r...

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Main Authors: A. V. Kolobov, D. J. Kim, A. Giussani, P. Fons, J. Tominaga, R. Calarco, A. Gruverman
Format: Article
Language:English
Published: AIP Publishing LLC 2014-06-01
Series:APL Materials
Online Access:http://dx.doi.org/10.1063/1.4881735
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author A. V. Kolobov
D. J. Kim
A. Giussani
P. Fons
J. Tominaga
R. Calarco
A. Gruverman
author_facet A. V. Kolobov
D. J. Kim
A. Giussani
P. Fons
J. Tominaga
R. Calarco
A. Gruverman
author_sort A. V. Kolobov
collection DOAJ
description In this paper, using a resonance-enhanced piezoresponse force microscopy approach supported by density functional theory computer simulations, we have demonstrated the ferroelectric switching in epitaxial GeTe films. It has been shown that in films with thickness on the order of several nanometers reversible reorientation of polarization occurs due to swapping of the shorter and longer Ge-Te bonds in the interior of the material. It is also hinted that for ultra thin films consisting of just several atomic layers weakly bonded to the substrate, ferroelectric switching may proceed through exchange of Ge and Te planes within individual GeTe layers.
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spelling doaj.art-e96a2ddd20df44ac972b5defa0c531b72022-12-21T19:07:15ZengAIP Publishing LLCAPL Materials2166-532X2014-06-0126066101066101-710.1063/1.4881735002406APMFerroelectric switching in epitaxial GeTe filmsA. V. Kolobov0D. J. Kim1A. Giussani2P. Fons3J. Tominaga4R. Calarco5A. Gruverman6Nanoelectronics Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba Central 4, 1-1-1 Higashi, Tsukuba, Ibaraki 305-8562 JapanDepartment of Physics and Astronomy, University of Nebraska, Lincoln, Nebraska 68588-0299, USAPaul-Drude-Institut für Festkörperelektronik, Hausvogteiplatz 5-7, 10117 Berlin, GermanyNanoelectronics Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba Central 4, 1-1-1 Higashi, Tsukuba, Ibaraki 305-8562 JapanNanoelectronics Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba Central 4, 1-1-1 Higashi, Tsukuba, Ibaraki 305-8562 JapanPaul-Drude-Institut für Festkörperelektronik, Hausvogteiplatz 5-7, 10117 Berlin, GermanyDepartment of Physics and Astronomy, University of Nebraska, Lincoln, Nebraska 68588-0299, USAIn this paper, using a resonance-enhanced piezoresponse force microscopy approach supported by density functional theory computer simulations, we have demonstrated the ferroelectric switching in epitaxial GeTe films. It has been shown that in films with thickness on the order of several nanometers reversible reorientation of polarization occurs due to swapping of the shorter and longer Ge-Te bonds in the interior of the material. It is also hinted that for ultra thin films consisting of just several atomic layers weakly bonded to the substrate, ferroelectric switching may proceed through exchange of Ge and Te planes within individual GeTe layers.http://dx.doi.org/10.1063/1.4881735
spellingShingle A. V. Kolobov
D. J. Kim
A. Giussani
P. Fons
J. Tominaga
R. Calarco
A. Gruverman
Ferroelectric switching in epitaxial GeTe films
APL Materials
title Ferroelectric switching in epitaxial GeTe films
title_full Ferroelectric switching in epitaxial GeTe films
title_fullStr Ferroelectric switching in epitaxial GeTe films
title_full_unstemmed Ferroelectric switching in epitaxial GeTe films
title_short Ferroelectric switching in epitaxial GeTe films
title_sort ferroelectric switching in epitaxial gete films
url http://dx.doi.org/10.1063/1.4881735
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