Minimizing electrostatic interactions from piezoresponse force microscopy via capacitive excitation
Piezoresponse force microscopy (PFM) has emerged as one of the most powerful techniques to probe ferroelectric materials at the nanoscale, yet it has been increasingly recognized that piezoresponse measured by PFM is often influenced by electrostatic interactions. In this letter, we report a capacit...
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Format: | Article |
Language: | English |
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Elsevier
2020-01-01
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Series: | Theoretical and Applied Mechanics Letters |
Online Access: | http://www.sciencedirect.com/science/article/pii/S2095034920300052 |
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author | Qingfeng Zhu Ehsan Nasr Esfahani Shuhong Xie Jiangyu Li |
author_facet | Qingfeng Zhu Ehsan Nasr Esfahani Shuhong Xie Jiangyu Li |
author_sort | Qingfeng Zhu |
collection | DOAJ |
description | Piezoresponse force microscopy (PFM) has emerged as one of the most powerful techniques to probe ferroelectric materials at the nanoscale, yet it has been increasingly recognized that piezoresponse measured by PFM is often influenced by electrostatic interactions. In this letter, we report a capacitive excitation PFM (ce-PFM) to minimize the electrostatic interactions. The effectiveness of ce-PFM in minimizing electrostatic interactions is demonstrated by comparing the piezoresponse and the effective piezoelectric coefficient measured by ce-PFM and conventional PFM. The effectiveness is further confirmed through the ferroelectric domain pattern imaged via ce-PFM and conventional PFM in vertical modes, with the corresponding domain contrast obtained by ce-PFM is sharper than conventional PFM. These results demonstrate ce-PFM as an effective tool to minimize the interference from electrostatic interactions and to image ferroelectric domain pattern, and it can be easily implemented in conventional atomic force microscope (AFM) setup to probe true piezoelectricity at the nanoscale. Keywords: Piezoresponse force microscopy, Electrostatic interactions, Capacitive excitation |
first_indexed | 2024-04-13T18:48:36Z |
format | Article |
id | doaj.art-e9a4411262d447efbe087be3189f3312 |
institution | Directory Open Access Journal |
issn | 2095-0349 |
language | English |
last_indexed | 2024-04-13T18:48:36Z |
publishDate | 2020-01-01 |
publisher | Elsevier |
record_format | Article |
series | Theoretical and Applied Mechanics Letters |
spelling | doaj.art-e9a4411262d447efbe087be3189f33122022-12-22T02:34:31ZengElsevierTheoretical and Applied Mechanics Letters2095-03492020-01-011012326Minimizing electrostatic interactions from piezoresponse force microscopy via capacitive excitationQingfeng Zhu0Ehsan Nasr Esfahani1Shuhong Xie2Jiangyu Li3Shenzhen Key Laboratory of Nanobiomechanics, Shenzhen Institutes of Advanced Technology, Chinese Academy of Sciences, Shenzhen 518055, China; Hunan Provincial Key Laboratory of Thin Film Materials and Devices, Xiangtan University, Xiangtan 411105, ChinaShenzhen Key Laboratory of Nanobiomechanics, Shenzhen Institutes of Advanced Technology, Chinese Academy of Sciences, Shenzhen 518055, China; Department of Mechanical Engineering, University of Washington, Seattle 98195, WA, USAKey Laboratory of Low Dimensional Materials and Application Technology of Ministry of Education, and School of Materials Science and Engineering, Xiangtan University, Xiangtan 411105, China; Corresponding authorShenzhen Key Laboratory of Nanobiomechanics, Shenzhen Institutes of Advanced Technology, Chinese Academy of Sciences, Shenzhen 518055, China; Department of Mechanical Engineering, University of Washington, Seattle 98195, WA, USA; Corresponding authorPiezoresponse force microscopy (PFM) has emerged as one of the most powerful techniques to probe ferroelectric materials at the nanoscale, yet it has been increasingly recognized that piezoresponse measured by PFM is often influenced by electrostatic interactions. In this letter, we report a capacitive excitation PFM (ce-PFM) to minimize the electrostatic interactions. The effectiveness of ce-PFM in minimizing electrostatic interactions is demonstrated by comparing the piezoresponse and the effective piezoelectric coefficient measured by ce-PFM and conventional PFM. The effectiveness is further confirmed through the ferroelectric domain pattern imaged via ce-PFM and conventional PFM in vertical modes, with the corresponding domain contrast obtained by ce-PFM is sharper than conventional PFM. These results demonstrate ce-PFM as an effective tool to minimize the interference from electrostatic interactions and to image ferroelectric domain pattern, and it can be easily implemented in conventional atomic force microscope (AFM) setup to probe true piezoelectricity at the nanoscale. Keywords: Piezoresponse force microscopy, Electrostatic interactions, Capacitive excitationhttp://www.sciencedirect.com/science/article/pii/S2095034920300052 |
spellingShingle | Qingfeng Zhu Ehsan Nasr Esfahani Shuhong Xie Jiangyu Li Minimizing electrostatic interactions from piezoresponse force microscopy via capacitive excitation Theoretical and Applied Mechanics Letters |
title | Minimizing electrostatic interactions from piezoresponse force microscopy via capacitive excitation |
title_full | Minimizing electrostatic interactions from piezoresponse force microscopy via capacitive excitation |
title_fullStr | Minimizing electrostatic interactions from piezoresponse force microscopy via capacitive excitation |
title_full_unstemmed | Minimizing electrostatic interactions from piezoresponse force microscopy via capacitive excitation |
title_short | Minimizing electrostatic interactions from piezoresponse force microscopy via capacitive excitation |
title_sort | minimizing electrostatic interactions from piezoresponse force microscopy via capacitive excitation |
url | http://www.sciencedirect.com/science/article/pii/S2095034920300052 |
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