Fabrication and Characterization of Ultra-wide Bandgap AlN-Based Schottky Diodes on Sapphire by MOCVD

AlN Schottky diodes with various device geometries were fabricated on sapphire substrate and their temperature-dependent current-voltage characteristics were analyzed. At forward bias, high ideality factors were obtained, indicating a large deviation from the ideal thermionic emission model. At reve...

Full description

Bibliographic Details
Main Authors: Houqiang Fu, Xuanqi Huang, Hong Chen, Zhijian Lu, Yuji Zhao
Format: Article
Language:English
Published: IEEE 2017-01-01
Series:IEEE Journal of the Electron Devices Society
Subjects:
Online Access:https://ieeexplore.ieee.org/document/8047476/
_version_ 1818369853088595968
author Houqiang Fu
Xuanqi Huang
Hong Chen
Zhijian Lu
Yuji Zhao
author_facet Houqiang Fu
Xuanqi Huang
Hong Chen
Zhijian Lu
Yuji Zhao
author_sort Houqiang Fu
collection DOAJ
description AlN Schottky diodes with various device geometries were fabricated on sapphire substrate and their temperature-dependent current-voltage characteristics were analyzed. At forward bias, high ideality factors were obtained, indicating a large deviation from the ideal thermionic emission model. At reverse bias, the breakdown voltage showed a negative temperature dependence, and the leakage current was well described using a 2-D variable-range hopping conduction model. Furthermore, the breakdown voltages and leakage currents of the devices showed a strong dependence on the surface distance between the ohmic and Schottky contacts, but a relatively small dependence on the area of the Schottky contacts. These results suggest surface states between ohmic and Schottky contacts play a more important role than the metal/AlN interface in determining the reverse breakdown and leakage current of AlN Schottky diodes. A quantitative study of AlN Schottky diodes at high temperature reveals a geometry-dependent surface breakdown electric field and surface leakage current. Surface passivation and treatments may enhance the device performances and impact the reverse breakdown and current leakage mechanisms. These results will serve as the guidance for the design and fabrication of future AlN electronic devices.
first_indexed 2024-12-13T23:30:26Z
format Article
id doaj.art-ea0d13d624dd4ac7b73bdc52c95d6a61
institution Directory Open Access Journal
issn 2168-6734
language English
last_indexed 2024-12-13T23:30:26Z
publishDate 2017-01-01
publisher IEEE
record_format Article
series IEEE Journal of the Electron Devices Society
spelling doaj.art-ea0d13d624dd4ac7b73bdc52c95d6a612022-12-21T23:27:26ZengIEEEIEEE Journal of the Electron Devices Society2168-67342017-01-015651852410.1109/JEDS.2017.27515548047476Fabrication and Characterization of Ultra-wide Bandgap AlN-Based Schottky Diodes on Sapphire by MOCVDHouqiang Fu0https://orcid.org/0000-0002-1125-8328Xuanqi Huang1Hong Chen2Zhijian Lu3Yuji Zhao4School of Electrical, Computer, and Energy Engineering, Arizona State University, Tempe, AZ, USASchool of Electrical, Computer, and Energy Engineering, Arizona State University, Tempe, AZ, USASchool of Electrical, Computer, and Energy Engineering, Arizona State University, Tempe, AZ, USASchool of Electrical, Computer, and Energy Engineering, Arizona State University, Tempe, AZ, USASchool of Electrical, Computer, and Energy Engineering, Arizona State University, Tempe, AZ, USAAlN Schottky diodes with various device geometries were fabricated on sapphire substrate and their temperature-dependent current-voltage characteristics were analyzed. At forward bias, high ideality factors were obtained, indicating a large deviation from the ideal thermionic emission model. At reverse bias, the breakdown voltage showed a negative temperature dependence, and the leakage current was well described using a 2-D variable-range hopping conduction model. Furthermore, the breakdown voltages and leakage currents of the devices showed a strong dependence on the surface distance between the ohmic and Schottky contacts, but a relatively small dependence on the area of the Schottky contacts. These results suggest surface states between ohmic and Schottky contacts play a more important role than the metal/AlN interface in determining the reverse breakdown and leakage current of AlN Schottky diodes. A quantitative study of AlN Schottky diodes at high temperature reveals a geometry-dependent surface breakdown electric field and surface leakage current. Surface passivation and treatments may enhance the device performances and impact the reverse breakdown and current leakage mechanisms. These results will serve as the guidance for the design and fabrication of future AlN electronic devices.https://ieeexplore.ieee.org/document/8047476/Aluminum nitrideSchottky diodessurface statesideality factorbreakdowncurrent leakage
spellingShingle Houqiang Fu
Xuanqi Huang
Hong Chen
Zhijian Lu
Yuji Zhao
Fabrication and Characterization of Ultra-wide Bandgap AlN-Based Schottky Diodes on Sapphire by MOCVD
IEEE Journal of the Electron Devices Society
Aluminum nitride
Schottky diodes
surface states
ideality factor
breakdown
current leakage
title Fabrication and Characterization of Ultra-wide Bandgap AlN-Based Schottky Diodes on Sapphire by MOCVD
title_full Fabrication and Characterization of Ultra-wide Bandgap AlN-Based Schottky Diodes on Sapphire by MOCVD
title_fullStr Fabrication and Characterization of Ultra-wide Bandgap AlN-Based Schottky Diodes on Sapphire by MOCVD
title_full_unstemmed Fabrication and Characterization of Ultra-wide Bandgap AlN-Based Schottky Diodes on Sapphire by MOCVD
title_short Fabrication and Characterization of Ultra-wide Bandgap AlN-Based Schottky Diodes on Sapphire by MOCVD
title_sort fabrication and characterization of ultra wide bandgap aln based schottky diodes on sapphire by mocvd
topic Aluminum nitride
Schottky diodes
surface states
ideality factor
breakdown
current leakage
url https://ieeexplore.ieee.org/document/8047476/
work_keys_str_mv AT houqiangfu fabricationandcharacterizationofultrawidebandgapalnbasedschottkydiodesonsapphirebymocvd
AT xuanqihuang fabricationandcharacterizationofultrawidebandgapalnbasedschottkydiodesonsapphirebymocvd
AT hongchen fabricationandcharacterizationofultrawidebandgapalnbasedschottkydiodesonsapphirebymocvd
AT zhijianlu fabricationandcharacterizationofultrawidebandgapalnbasedschottkydiodesonsapphirebymocvd
AT yujizhao fabricationandcharacterizationofultrawidebandgapalnbasedschottkydiodesonsapphirebymocvd