Multi-layer lithography using focal plane changing for SU-8 microstructures
In this paper, we report on a type of SU-8 microstructure with vertical sidewalls used for polydimethydiloxane (PDMS) microchannels. Multi-layer lithography using focal plane changing approach is proposed to expose the SU-8 photoresist based on a digital micromirror device (DMD) maskless lithography...
| Main Authors: | , , , |
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| Format: | Article |
| Language: | English |
| Published: |
IOP Publishing
2020-01-01
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| Series: | Materials Research Express |
| Subjects: | |
| Online Access: | https://doi.org/10.1088/2053-1591/ab98cc |
| _version_ | 1797746370642182144 |
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| author | Qiming Chen Jinyun Zhou Qi Zheng Yiming Hu |
| author_facet | Qiming Chen Jinyun Zhou Qi Zheng Yiming Hu |
| author_sort | Qiming Chen |
| collection | DOAJ |
| description | In this paper, we report on a type of SU-8 microstructure with vertical sidewalls used for polydimethydiloxane (PDMS) microchannels. Multi-layer lithography using focal plane changing approach is proposed to expose the SU-8 photoresist based on a digital micromirror device (DMD) maskless lithography system. We used a light-emitting diode source with a wavelength of 405 nm. The thickness of the SU-8 is divided into multi-layers according to the depth of focus. Each layer corresponds to a depth of focus, and then, a virtual mask is designed for the layer. Finally, each layer is exposed to changes in the focal plane. The results indicate that the actual profile of the SU-8 mold shows good agreement with the design profile without any T-profiles. Additionally, there is better linewidth in the proposed method compared with multi-exposure by a single fixed focal plane. The PDMS microchannels result also demonstrate the stability of the SU-8 mold. |
| first_indexed | 2024-03-12T15:35:51Z |
| format | Article |
| id | doaj.art-ea3bc020d2d647d5bdd3151834a0f43e |
| institution | Directory Open Access Journal |
| issn | 2053-1591 |
| language | English |
| last_indexed | 2024-03-12T15:35:51Z |
| publishDate | 2020-01-01 |
| publisher | IOP Publishing |
| record_format | Article |
| series | Materials Research Express |
| spelling | doaj.art-ea3bc020d2d647d5bdd3151834a0f43e2023-08-09T16:15:15ZengIOP PublishingMaterials Research Express2053-15912020-01-017606530610.1088/2053-1591/ab98ccMulti-layer lithography using focal plane changing for SU-8 microstructuresQiming Chen0https://orcid.org/0000-0003-2119-9664Jinyun Zhou1Qi Zheng2Yiming Hu3Department of School of Physics and Optoelectronic Engineering, Guangdong University of Technology , Guangzhou, 510006, People’s Republic of ChinaDepartment of School of Physics and Optoelectronic Engineering, Guangdong University of Technology , Guangzhou, 510006, People’s Republic of ChinaDepartment of School of Physics and Optoelectronic Engineering, Guangdong University of Technology , Guangzhou, 510006, People’s Republic of ChinaDepartment of School of Physics and Optoelectronic Engineering, Guangdong University of Technology , Guangzhou, 510006, People’s Republic of ChinaIn this paper, we report on a type of SU-8 microstructure with vertical sidewalls used for polydimethydiloxane (PDMS) microchannels. Multi-layer lithography using focal plane changing approach is proposed to expose the SU-8 photoresist based on a digital micromirror device (DMD) maskless lithography system. We used a light-emitting diode source with a wavelength of 405 nm. The thickness of the SU-8 is divided into multi-layers according to the depth of focus. Each layer corresponds to a depth of focus, and then, a virtual mask is designed for the layer. Finally, each layer is exposed to changes in the focal plane. The results indicate that the actual profile of the SU-8 mold shows good agreement with the design profile without any T-profiles. Additionally, there is better linewidth in the proposed method compared with multi-exposure by a single fixed focal plane. The PDMS microchannels result also demonstrate the stability of the SU-8 mold.https://doi.org/10.1088/2053-1591/ab98ccDMDmulti-layer lithographySU-8focal plane changing |
| spellingShingle | Qiming Chen Jinyun Zhou Qi Zheng Yiming Hu Multi-layer lithography using focal plane changing for SU-8 microstructures Materials Research Express DMD multi-layer lithography SU-8 focal plane changing |
| title | Multi-layer lithography using focal plane changing for SU-8 microstructures |
| title_full | Multi-layer lithography using focal plane changing for SU-8 microstructures |
| title_fullStr | Multi-layer lithography using focal plane changing for SU-8 microstructures |
| title_full_unstemmed | Multi-layer lithography using focal plane changing for SU-8 microstructures |
| title_short | Multi-layer lithography using focal plane changing for SU-8 microstructures |
| title_sort | multi layer lithography using focal plane changing for su 8 microstructures |
| topic | DMD multi-layer lithography SU-8 focal plane changing |
| url | https://doi.org/10.1088/2053-1591/ab98cc |
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