Potentiostatic Electrodeposition of Cu2O under Light and Dark for Photoelectrochemical Hydrogen Generation Applications
Potentiostatic electrodeposition conducted at various deposition voltages from lactate-stabilized copper sulfate electrolyte was used for preparation of Cu2O layers for Photoelectrochemical (PEC) production of hydrogen. A novel approach based on an application of light during the electrodeposition i...
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| Format: | Article |
| Language: | English |
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VSB-Technical University of Ostrava
2018-01-01
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| Series: | Advances in Electrical and Electronic Engineering |
| Subjects: | |
| Online Access: | http://advances.utc.sk/index.php/AEEE/article/view/2749 |
| _version_ | 1827947528954314752 |
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| author | Miroslav Mikolasek Peter Ondrejka Filip Chymo Patrik Novak Ladislav Harmatha Vlastimil Rehacek Ivan Hotovy |
| author_facet | Miroslav Mikolasek Peter Ondrejka Filip Chymo Patrik Novak Ladislav Harmatha Vlastimil Rehacek Ivan Hotovy |
| author_sort | Miroslav Mikolasek |
| collection | DOAJ |
| description | Potentiostatic electrodeposition conducted at various deposition voltages from lactate-stabilized copper sulfate electrolyte was used for preparation of Cu2O layers for Photoelectrochemical (PEC) production of hydrogen. A novel approach based on an application of light during the electrodeposition is utilized to suppress the potential drop in the Cu2O layer during the potentiostatic deposition. Structures prepared under dark and light on an Ag substrate are analyzed by X-Ray Diffraction analysis (XRD), Scanning Electron Microscopy (SEM) and Linear Sweep Voltammetry (LSV). It was shown that the application of light increases the deposition rate due to the contribution of the photogenerated carriers. The deposition voltage affects the photoresponse of light deposited structures but causes only a negligible change in dark deposited structures. The light deposited samples exhibited a higher photoresponse for all deposition voltages. The presented study suggests the light potentiostatic electrodeposition as an attractive approach for the preparation of Cu2O structures for cheap and efficient photoelectrochemical water splitting applications. |
| first_indexed | 2024-04-09T12:41:23Z |
| format | Article |
| id | doaj.art-eb191ffe5d0d471f8c1463ce50242241 |
| institution | Directory Open Access Journal |
| issn | 1336-1376 1804-3119 |
| language | English |
| last_indexed | 2024-04-09T12:41:23Z |
| publishDate | 2018-01-01 |
| publisher | VSB-Technical University of Ostrava |
| record_format | Article |
| series | Advances in Electrical and Electronic Engineering |
| spelling | doaj.art-eb191ffe5d0d471f8c1463ce502422412023-05-14T20:50:12ZengVSB-Technical University of OstravaAdvances in Electrical and Electronic Engineering1336-13761804-31192018-01-0116336737310.15598/aeee.v16i3.27491006Potentiostatic Electrodeposition of Cu2O under Light and Dark for Photoelectrochemical Hydrogen Generation ApplicationsMiroslav Mikolasek0Peter Ondrejka1Filip Chymo2Patrik Novak3Ladislav Harmatha4Vlastimil Rehacek5Ivan Hotovy6Institute of Electronics and Photonics, Faculty of Electrical Engineering and Information Technology, Slovak University of Technology, Ilkovicova 3, 812 19 Bratislava, SlovakiaInstitute of Electronics and Photonics, Faculty of Electrical Engineering and Information Technology, Slovak University of Technology, Ilkovicova 3, 812 19 Bratislava, SlovakiaInstitute of Electronics and Photonics, Faculty of Electrical Engineering and Information Technology, Slovak University of Technology, Ilkovicova 3, 812 19 Bratislava, SlovakiaInstitute of Nuclear and Physical Engineering, Faculty of Electrical Engineering and Information Technology, Slovak University of Technology, Ilkovicova 3, 812 19 Bratislava, SlovakiaInstitute of Electronics and Photonics, Faculty of Electrical Engineering and Information Technology, Slovak University of Technology, Ilkovicova 3, 812 19 Bratislava, SlovakiaInstitute of Electronics and Photonics, Faculty of Electrical Engineering and Information Technology, Slovak University of Technology, Ilkovicova 3, 812 19 Bratislava, SlovakiaInstitute of Electronics and Photonics, Faculty of Electrical Engineering and Information Technology, Slovak University of Technology, Ilkovicova 3, 812 19 Bratislava, SlovakiaPotentiostatic electrodeposition conducted at various deposition voltages from lactate-stabilized copper sulfate electrolyte was used for preparation of Cu2O layers for Photoelectrochemical (PEC) production of hydrogen. A novel approach based on an application of light during the electrodeposition is utilized to suppress the potential drop in the Cu2O layer during the potentiostatic deposition. Structures prepared under dark and light on an Ag substrate are analyzed by X-Ray Diffraction analysis (XRD), Scanning Electron Microscopy (SEM) and Linear Sweep Voltammetry (LSV). It was shown that the application of light increases the deposition rate due to the contribution of the photogenerated carriers. The deposition voltage affects the photoresponse of light deposited structures but causes only a negligible change in dark deposited structures. The light deposited samples exhibited a higher photoresponse for all deposition voltages. The presented study suggests the light potentiostatic electrodeposition as an attractive approach for the preparation of Cu2O structures for cheap and efficient photoelectrochemical water splitting applications.http://advances.utc.sk/index.php/AEEE/article/view/2749cu2oelectrodeposition under lighthydrogenxrdwater splitting. |
| spellingShingle | Miroslav Mikolasek Peter Ondrejka Filip Chymo Patrik Novak Ladislav Harmatha Vlastimil Rehacek Ivan Hotovy Potentiostatic Electrodeposition of Cu2O under Light and Dark for Photoelectrochemical Hydrogen Generation Applications Advances in Electrical and Electronic Engineering cu2o electrodeposition under light hydrogen xrd water splitting. |
| title | Potentiostatic Electrodeposition of Cu2O under Light and Dark for Photoelectrochemical Hydrogen Generation Applications |
| title_full | Potentiostatic Electrodeposition of Cu2O under Light and Dark for Photoelectrochemical Hydrogen Generation Applications |
| title_fullStr | Potentiostatic Electrodeposition of Cu2O under Light and Dark for Photoelectrochemical Hydrogen Generation Applications |
| title_full_unstemmed | Potentiostatic Electrodeposition of Cu2O under Light and Dark for Photoelectrochemical Hydrogen Generation Applications |
| title_short | Potentiostatic Electrodeposition of Cu2O under Light and Dark for Photoelectrochemical Hydrogen Generation Applications |
| title_sort | potentiostatic electrodeposition of cu2o under light and dark for photoelectrochemical hydrogen generation applications |
| topic | cu2o electrodeposition under light hydrogen xrd water splitting. |
| url | http://advances.utc.sk/index.php/AEEE/article/view/2749 |
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