Lithographic hotspot detection based on SVM and genetic algorithm(基于支持向量机及遗传算法的光刻热点检测)
提出一种基于支持向量机(SVM)及遗传算法(GA)的集成电路版图光刻热点检测方法.首先对版图样本进行离散余弦变换(DCT)以提取样本的频域特征,然后基于这些样本训练SVM分类器以实现对光刻热点的检测.为了提高光刻热点检测的精度及效率,采用遗传算法(GA)对频域特征进行选择,并同时优化SVM参数.实验结果表明,基于SVM及版图频域特征并结合遗传算法进行优化的光刻热点检测方法可以有效提高版图光刻热点的检测精度....
Main Authors: | CAOKui-kang(曹葵康), SHENHai-bin(沈海斌), YANGYi-wei(杨祎巍) |
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Format: | Article |
Language: | zho |
Published: |
Zhejiang University Press
2011-01-01
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Series: | Zhejiang Daxue xuebao. Lixue ban |
Subjects: | |
Online Access: | https://doi.org/10.3785/j.issn.1008-9497.2011.01.011 |
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