Thermal Performance of Cu Electroplated GaN/AlGaN High-Electron-Mobility Transistors with Various-Thickness Si Substrates

Thermal dissipation is an important issue for power devices. In this work, the impact of thermal effects on the performance of Cu electroplated GaN-based high-electron-mobility transistors (HEMTs) are considered. Electrical, thermometry and micro-Raman characterization techniques were used to correl...

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Main Authors: Ray-Hua Horng, Hsiao-Yun Yeh, Niall Tumilty
Format: Article
Language:English
Published: MDPI AG 2023-04-01
Series:Electronics
Subjects:
Online Access:https://www.mdpi.com/2079-9292/12/9/2033
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author Ray-Hua Horng
Hsiao-Yun Yeh
Niall Tumilty
author_facet Ray-Hua Horng
Hsiao-Yun Yeh
Niall Tumilty
author_sort Ray-Hua Horng
collection DOAJ
description Thermal dissipation is an important issue for power devices. In this work, the impact of thermal effects on the performance of Cu electroplated GaN-based high-electron-mobility transistors (HEMTs) are considered. Electrical, thermometry and micro-Raman characterization techniques were used to correlate the effects of improved heat dissipation on device performance for GaN HEMTs with different thicknesses of Si substrate (50, 100, 150 μm), with and without an additional electroplated Cu layer. GaN HEMTs on electroplated Cu on Si (≤50 μm) demonstrate an enhanced on/off current ratio compared to bare Si substrate by a factor of ~400 (from 9.61 × 10<sup>5</sup> to 4.03 × 10<sup>8</sup>). Of particular importance, surface temperature measurements reveal a much lower channel temperature for thinner HEMT devices with electroplated Cu samples compared to those without.
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spelling doaj.art-eb4d0deec1a6478295bfb1f282ab6eb42023-11-17T22:47:47ZengMDPI AGElectronics2079-92922023-04-01129203310.3390/electronics12092033Thermal Performance of Cu Electroplated GaN/AlGaN High-Electron-Mobility Transistors with Various-Thickness Si SubstratesRay-Hua Horng0Hsiao-Yun Yeh1Niall Tumilty2Institute of Electronics, National Yang Ming Chiao Tung University, Hsinchu 30010, TaiwanInstitute of Electronics, National Yang Ming Chiao Tung University, Hsinchu 30010, TaiwanInternational College of Semiconductor Technology, National Yang Ming Chiao Tung University, Hsinchu 30010, TaiwanThermal dissipation is an important issue for power devices. In this work, the impact of thermal effects on the performance of Cu electroplated GaN-based high-electron-mobility transistors (HEMTs) are considered. Electrical, thermometry and micro-Raman characterization techniques were used to correlate the effects of improved heat dissipation on device performance for GaN HEMTs with different thicknesses of Si substrate (50, 100, 150 μm), with and without an additional electroplated Cu layer. GaN HEMTs on electroplated Cu on Si (≤50 μm) demonstrate an enhanced on/off current ratio compared to bare Si substrate by a factor of ~400 (from 9.61 × 10<sup>5</sup> to 4.03 × 10<sup>8</sup>). Of particular importance, surface temperature measurements reveal a much lower channel temperature for thinner HEMT devices with electroplated Cu samples compared to those without.https://www.mdpi.com/2079-9292/12/9/2033GaNHEMTcopper electroplatingRaman thermometry
spellingShingle Ray-Hua Horng
Hsiao-Yun Yeh
Niall Tumilty
Thermal Performance of Cu Electroplated GaN/AlGaN High-Electron-Mobility Transistors with Various-Thickness Si Substrates
Electronics
GaN
HEMT
copper electroplating
Raman thermometry
title Thermal Performance of Cu Electroplated GaN/AlGaN High-Electron-Mobility Transistors with Various-Thickness Si Substrates
title_full Thermal Performance of Cu Electroplated GaN/AlGaN High-Electron-Mobility Transistors with Various-Thickness Si Substrates
title_fullStr Thermal Performance of Cu Electroplated GaN/AlGaN High-Electron-Mobility Transistors with Various-Thickness Si Substrates
title_full_unstemmed Thermal Performance of Cu Electroplated GaN/AlGaN High-Electron-Mobility Transistors with Various-Thickness Si Substrates
title_short Thermal Performance of Cu Electroplated GaN/AlGaN High-Electron-Mobility Transistors with Various-Thickness Si Substrates
title_sort thermal performance of cu electroplated gan algan high electron mobility transistors with various thickness si substrates
topic GaN
HEMT
copper electroplating
Raman thermometry
url https://www.mdpi.com/2079-9292/12/9/2033
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AT hsiaoyunyeh thermalperformanceofcuelectroplatedganalganhighelectronmobilitytransistorswithvariousthicknesssisubstrates
AT nialltumilty thermalperformanceofcuelectroplatedganalganhighelectronmobilitytransistorswithvariousthicknesssisubstrates