Comparing cleaning effects of gas and vapor bubbles in ultrasonic fields
The dynamic actions of cavitation bubbles in ultrasonic fields can clean surfaces. Gas and vapor cavitation bubbles exhibit different dynamic behaviors in ultrasonic fields, yet little attention has been given to the distinctive cleaning effects of gas and vapor bubbles. We present an experimental i...
Main Authors: | , , , , , |
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Format: | Article |
Language: | English |
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Elsevier
2021-08-01
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Series: | Ultrasonics Sonochemistry |
Subjects: | |
Online Access: | http://www.sciencedirect.com/science/article/pii/S1350417721001607 |
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author | Ryeol Park Minsu Choi Eun Hyun Park Won-Jun Shon Ho-Young Kim Wonjung Kim |
author_facet | Ryeol Park Minsu Choi Eun Hyun Park Won-Jun Shon Ho-Young Kim Wonjung Kim |
author_sort | Ryeol Park |
collection | DOAJ |
description | The dynamic actions of cavitation bubbles in ultrasonic fields can clean surfaces. Gas and vapor cavitation bubbles exhibit different dynamic behaviors in ultrasonic fields, yet little attention has been given to the distinctive cleaning effects of gas and vapor bubbles. We present an experimental investigation of surface cleaning by gas and vapor bubbles in an ultrasonic field. Using high-speed videography, we found that the primary motions of gas and vapor bubbles responsible for surface cleaning differ. Our cleaning tests under different contamination conditions in terms of contaminant adhesion strength and surface wettability reveal that vapor and gas bubbles are more effective at removing contaminants with strong and weak adhesion, respectively, and furthermore that hydrophobic substrates are better cleaned by vapor bubbles. Our study not only provides a better physical understanding of the ultrasonic cleaning process, but also proposes novel techniques to improve ultrasonic cleaning by selectively employing gas and vapor bubbles depending on the characteristics of the surface to be cleaned. |
first_indexed | 2024-12-22T12:02:45Z |
format | Article |
id | doaj.art-ebbf7fd1f30441a59b805214f4febaa8 |
institution | Directory Open Access Journal |
issn | 1350-4177 |
language | English |
last_indexed | 2024-12-22T12:02:45Z |
publishDate | 2021-08-01 |
publisher | Elsevier |
record_format | Article |
series | Ultrasonics Sonochemistry |
spelling | doaj.art-ebbf7fd1f30441a59b805214f4febaa82022-12-21T18:26:32ZengElsevierUltrasonics Sonochemistry1350-41772021-08-0176105618Comparing cleaning effects of gas and vapor bubbles in ultrasonic fieldsRyeol Park0Minsu Choi1Eun Hyun Park2Won-Jun Shon3Ho-Young Kim4Wonjung Kim5Department of Mechanical Engineering, Sogang University, Seoul 04107, South KoreaDepartment of Mechanical Engineering, Sogang University, Seoul 04107, South KoreaSchool of Dentistry, UCLA, Los Angeles, CA 90095, USADepartment of Conservative Dentistry, Dental Research Institute and School of Dentistry, Seoul National University, Seoul 03080, South KoreaDepartment of Mechanical Engineering, Seoul National University, Seoul 08826, South Korea; Corresponding authors.Department of Mechanical Engineering, Sogang University, Seoul 04107, South Korea; Institute of Emergent Materials, Sogang University, Seoul 04107, South Korea; Corresponding authors.The dynamic actions of cavitation bubbles in ultrasonic fields can clean surfaces. Gas and vapor cavitation bubbles exhibit different dynamic behaviors in ultrasonic fields, yet little attention has been given to the distinctive cleaning effects of gas and vapor bubbles. We present an experimental investigation of surface cleaning by gas and vapor bubbles in an ultrasonic field. Using high-speed videography, we found that the primary motions of gas and vapor bubbles responsible for surface cleaning differ. Our cleaning tests under different contamination conditions in terms of contaminant adhesion strength and surface wettability reveal that vapor and gas bubbles are more effective at removing contaminants with strong and weak adhesion, respectively, and furthermore that hydrophobic substrates are better cleaned by vapor bubbles. Our study not only provides a better physical understanding of the ultrasonic cleaning process, but also proposes novel techniques to improve ultrasonic cleaning by selectively employing gas and vapor bubbles depending on the characteristics of the surface to be cleaned.http://www.sciencedirect.com/science/article/pii/S1350417721001607Ultrasonic cleaningAcoustic cavitationGas bubblesVapor bubbles |
spellingShingle | Ryeol Park Minsu Choi Eun Hyun Park Won-Jun Shon Ho-Young Kim Wonjung Kim Comparing cleaning effects of gas and vapor bubbles in ultrasonic fields Ultrasonics Sonochemistry Ultrasonic cleaning Acoustic cavitation Gas bubbles Vapor bubbles |
title | Comparing cleaning effects of gas and vapor bubbles in ultrasonic fields |
title_full | Comparing cleaning effects of gas and vapor bubbles in ultrasonic fields |
title_fullStr | Comparing cleaning effects of gas and vapor bubbles in ultrasonic fields |
title_full_unstemmed | Comparing cleaning effects of gas and vapor bubbles in ultrasonic fields |
title_short | Comparing cleaning effects of gas and vapor bubbles in ultrasonic fields |
title_sort | comparing cleaning effects of gas and vapor bubbles in ultrasonic fields |
topic | Ultrasonic cleaning Acoustic cavitation Gas bubbles Vapor bubbles |
url | http://www.sciencedirect.com/science/article/pii/S1350417721001607 |
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