Quasi-seamless stitching for large-area micropatterned surfaces enabled by Fourier spectral analysis of moiré patterns

Abstract The main challenge in preparing a flexible mold stamp using roll-to-roll nanoimprint lithography is to simultaneously increase the imprintable area with a minimized perceptible seam. However, the current methods for stitching multiple small molds to fabricate large-area molds and functional...

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Main Authors: Woo Young Kim, Bo Wook Seo, Sang Hoon Lee, Tae Gyung Lee, Sin Kwon, Won Seok Chang, Sang-Hoon Nam, Nicholas X. Fang, Seok Kim, Young Tae Cho
Format: Article
Language:English
Published: Nature Portfolio 2023-04-01
Series:Nature Communications
Online Access:https://doi.org/10.1038/s41467-023-37828-8
_version_ 1797840964106059776
author Woo Young Kim
Bo Wook Seo
Sang Hoon Lee
Tae Gyung Lee
Sin Kwon
Won Seok Chang
Sang-Hoon Nam
Nicholas X. Fang
Seok Kim
Young Tae Cho
author_facet Woo Young Kim
Bo Wook Seo
Sang Hoon Lee
Tae Gyung Lee
Sin Kwon
Won Seok Chang
Sang-Hoon Nam
Nicholas X. Fang
Seok Kim
Young Tae Cho
author_sort Woo Young Kim
collection DOAJ
description Abstract The main challenge in preparing a flexible mold stamp using roll-to-roll nanoimprint lithography is to simultaneously increase the imprintable area with a minimized perceptible seam. However, the current methods for stitching multiple small molds to fabricate large-area molds and functional surfaces typically rely on the alignment mark, which inevitably produces a clear alignment mark and stitched seam. In this study, we propose a mark-less alignment by the pattern itself method inspired by moiré technique, which uses the Fourier spectral analysis of moiré patterns formed by superposed identical patterns for alignment. This method is capable of fabricating scalable functional surfaces and imprint molds with quasi-seamless and alignment mark-free patterning. By harnessing the rotational invariance property in the Fourier transform, our approach is confirmed to be a simple and efficient method for extracting the rotational and translational offsets in overlapped periodic or nonperiodic patterns with a minimized stitched region, thereby allowing for the large-area and quasi-seamless fabrication of imprinting molds and functional surfaces, such as liquid-repellent film and micro-optical sheets, that surpass the conventional alignment and stitching limits and potentially expand their application in producing large-area metasurfaces.
first_indexed 2024-04-09T16:23:24Z
format Article
id doaj.art-ec04bf06fbaa474a96951786c8106cce
institution Directory Open Access Journal
issn 2041-1723
language English
last_indexed 2024-04-09T16:23:24Z
publishDate 2023-04-01
publisher Nature Portfolio
record_format Article
series Nature Communications
spelling doaj.art-ec04bf06fbaa474a96951786c8106cce2023-04-23T11:21:24ZengNature PortfolioNature Communications2041-17232023-04-011411910.1038/s41467-023-37828-8Quasi-seamless stitching for large-area micropatterned surfaces enabled by Fourier spectral analysis of moiré patternsWoo Young Kim0Bo Wook Seo1Sang Hoon Lee2Tae Gyung Lee3Sin Kwon4Won Seok Chang5Sang-Hoon Nam6Nicholas X. Fang7Seok Kim8Young Tae Cho9Department of Smart Manufacturing Engineering, Changwon National UniversityDepartment of Smart Manufacturing Engineering, Changwon National UniversityDepartment of Smart Manufacturing Engineering, Changwon National UniversityDepartment of Smart Manufacturing Engineering, Changwon National UniversityDepartment of Flexible & Printed Electronics, Korea Institute of Machinery and MaterialsDepartment of Nano Manufacturing Technology, Korea Institute of Machinery and MaterialsDepartment of Mechanical Engineering, Massachusetts Institute of TechnologyDepartment of Mechanical Engineering, Massachusetts Institute of TechnologyDepartment of Smart Manufacturing Engineering, Changwon National UniversityDepartment of Smart Manufacturing Engineering, Changwon National UniversityAbstract The main challenge in preparing a flexible mold stamp using roll-to-roll nanoimprint lithography is to simultaneously increase the imprintable area with a minimized perceptible seam. However, the current methods for stitching multiple small molds to fabricate large-area molds and functional surfaces typically rely on the alignment mark, which inevitably produces a clear alignment mark and stitched seam. In this study, we propose a mark-less alignment by the pattern itself method inspired by moiré technique, which uses the Fourier spectral analysis of moiré patterns formed by superposed identical patterns for alignment. This method is capable of fabricating scalable functional surfaces and imprint molds with quasi-seamless and alignment mark-free patterning. By harnessing the rotational invariance property in the Fourier transform, our approach is confirmed to be a simple and efficient method for extracting the rotational and translational offsets in overlapped periodic or nonperiodic patterns with a minimized stitched region, thereby allowing for the large-area and quasi-seamless fabrication of imprinting molds and functional surfaces, such as liquid-repellent film and micro-optical sheets, that surpass the conventional alignment and stitching limits and potentially expand their application in producing large-area metasurfaces.https://doi.org/10.1038/s41467-023-37828-8
spellingShingle Woo Young Kim
Bo Wook Seo
Sang Hoon Lee
Tae Gyung Lee
Sin Kwon
Won Seok Chang
Sang-Hoon Nam
Nicholas X. Fang
Seok Kim
Young Tae Cho
Quasi-seamless stitching for large-area micropatterned surfaces enabled by Fourier spectral analysis of moiré patterns
Nature Communications
title Quasi-seamless stitching for large-area micropatterned surfaces enabled by Fourier spectral analysis of moiré patterns
title_full Quasi-seamless stitching for large-area micropatterned surfaces enabled by Fourier spectral analysis of moiré patterns
title_fullStr Quasi-seamless stitching for large-area micropatterned surfaces enabled by Fourier spectral analysis of moiré patterns
title_full_unstemmed Quasi-seamless stitching for large-area micropatterned surfaces enabled by Fourier spectral analysis of moiré patterns
title_short Quasi-seamless stitching for large-area micropatterned surfaces enabled by Fourier spectral analysis of moiré patterns
title_sort quasi seamless stitching for large area micropatterned surfaces enabled by fourier spectral analysis of moire patterns
url https://doi.org/10.1038/s41467-023-37828-8
work_keys_str_mv AT wooyoungkim quasiseamlessstitchingforlargeareamicropatternedsurfacesenabledbyfourierspectralanalysisofmoirepatterns
AT bowookseo quasiseamlessstitchingforlargeareamicropatternedsurfacesenabledbyfourierspectralanalysisofmoirepatterns
AT sanghoonlee quasiseamlessstitchingforlargeareamicropatternedsurfacesenabledbyfourierspectralanalysisofmoirepatterns
AT taegyunglee quasiseamlessstitchingforlargeareamicropatternedsurfacesenabledbyfourierspectralanalysisofmoirepatterns
AT sinkwon quasiseamlessstitchingforlargeareamicropatternedsurfacesenabledbyfourierspectralanalysisofmoirepatterns
AT wonseokchang quasiseamlessstitchingforlargeareamicropatternedsurfacesenabledbyfourierspectralanalysisofmoirepatterns
AT sanghoonnam quasiseamlessstitchingforlargeareamicropatternedsurfacesenabledbyfourierspectralanalysisofmoirepatterns
AT nicholasxfang quasiseamlessstitchingforlargeareamicropatternedsurfacesenabledbyfourierspectralanalysisofmoirepatterns
AT seokkim quasiseamlessstitchingforlargeareamicropatternedsurfacesenabledbyfourierspectralanalysisofmoirepatterns
AT youngtaecho quasiseamlessstitchingforlargeareamicropatternedsurfacesenabledbyfourierspectralanalysisofmoirepatterns