Oxidative chemical vapor deposition of polyaniline thin films
Polyaniline (PANI) is synthesized via oxidative chemical vapor deposition (oCVD) using aniline as monomer and antimony pentachloride as oxidant. Microscopy and spectroscopy indicate that oCVD processing conditions influence the PANI film chemistry, oxidation, and doping level. Fourier transform infr...
| Main Authors: | , , |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
Beilstein-Institut
2017-06-01
|
| Series: | Beilstein Journal of Nanotechnology |
| Subjects: | |
| Online Access: | https://doi.org/10.3762/bjnano.8.128 |
| _version_ | 1819364473150898176 |
|---|---|
| author | Yuriy Y. Smolin Masoud Soroush Kenneth K. S. Lau |
| author_facet | Yuriy Y. Smolin Masoud Soroush Kenneth K. S. Lau |
| author_sort | Yuriy Y. Smolin |
| collection | DOAJ |
| description | Polyaniline (PANI) is synthesized via oxidative chemical vapor deposition (oCVD) using aniline as monomer and antimony pentachloride as oxidant. Microscopy and spectroscopy indicate that oCVD processing conditions influence the PANI film chemistry, oxidation, and doping level. Fourier transform infrared spectroscopy (FTIR), scanning electron microscopy (SEM), and X-ray photoelectron spectroscopy (XPS) indicate that a substrate temperature of 90 °C is needed to minimize the formation of oligomers during polymerization. Lower substrate temperatures, such as 25 °C, lead to a film that mostly includes oligomers. Increasing the oxidant flowrate to nearly match the monomer flowrate favors the deposition of PANI in the emeraldine state, and varying the oxidant flowrate can directly influence the oxidation state of PANI. Changing the reactor pressure from 700 to 35 mTorr does not have a significant effect on the deposited film chemistry, indicating that the oCVD PANI process is not concentration dependent. This work shows that oCVD can be used for depositing PANI and for effectively controlling the chemical state of PANI. |
| first_indexed | 2024-12-24T22:59:30Z |
| format | Article |
| id | doaj.art-ef841c79040e48c79f377492318d7482 |
| institution | Directory Open Access Journal |
| issn | 2190-4286 |
| language | English |
| last_indexed | 2024-12-24T22:59:30Z |
| publishDate | 2017-06-01 |
| publisher | Beilstein-Institut |
| record_format | Article |
| series | Beilstein Journal of Nanotechnology |
| spelling | doaj.art-ef841c79040e48c79f377492318d74822022-12-21T16:35:10ZengBeilstein-InstitutBeilstein Journal of Nanotechnology2190-42862017-06-01811266127610.3762/bjnano.8.1282190-4286-8-128Oxidative chemical vapor deposition of polyaniline thin filmsYuriy Y. Smolin0Masoud Soroush1Kenneth K. S. Lau2Department of Chemical and Biological Engineering, Drexel University, Philadelphia, PA 19104, USADepartment of Chemical and Biological Engineering, Drexel University, Philadelphia, PA 19104, USADepartment of Chemical and Biological Engineering, Drexel University, Philadelphia, PA 19104, USAPolyaniline (PANI) is synthesized via oxidative chemical vapor deposition (oCVD) using aniline as monomer and antimony pentachloride as oxidant. Microscopy and spectroscopy indicate that oCVD processing conditions influence the PANI film chemistry, oxidation, and doping level. Fourier transform infrared spectroscopy (FTIR), scanning electron microscopy (SEM), and X-ray photoelectron spectroscopy (XPS) indicate that a substrate temperature of 90 °C is needed to minimize the formation of oligomers during polymerization. Lower substrate temperatures, such as 25 °C, lead to a film that mostly includes oligomers. Increasing the oxidant flowrate to nearly match the monomer flowrate favors the deposition of PANI in the emeraldine state, and varying the oxidant flowrate can directly influence the oxidation state of PANI. Changing the reactor pressure from 700 to 35 mTorr does not have a significant effect on the deposited film chemistry, indicating that the oCVD PANI process is not concentration dependent. This work shows that oCVD can be used for depositing PANI and for effectively controlling the chemical state of PANI.https://doi.org/10.3762/bjnano.8.128conducting polymersemeraldine oxidation stateoxidative chemical vapor depositionpolyanilinethin film processing |
| spellingShingle | Yuriy Y. Smolin Masoud Soroush Kenneth K. S. Lau Oxidative chemical vapor deposition of polyaniline thin films Beilstein Journal of Nanotechnology conducting polymers emeraldine oxidation state oxidative chemical vapor deposition polyaniline thin film processing |
| title | Oxidative chemical vapor deposition of polyaniline thin films |
| title_full | Oxidative chemical vapor deposition of polyaniline thin films |
| title_fullStr | Oxidative chemical vapor deposition of polyaniline thin films |
| title_full_unstemmed | Oxidative chemical vapor deposition of polyaniline thin films |
| title_short | Oxidative chemical vapor deposition of polyaniline thin films |
| title_sort | oxidative chemical vapor deposition of polyaniline thin films |
| topic | conducting polymers emeraldine oxidation state oxidative chemical vapor deposition polyaniline thin film processing |
| url | https://doi.org/10.3762/bjnano.8.128 |
| work_keys_str_mv | AT yuriyysmolin oxidativechemicalvapordepositionofpolyanilinethinfilms AT masoudsoroush oxidativechemicalvapordepositionofpolyanilinethinfilms AT kennethkslau oxidativechemicalvapordepositionofpolyanilinethinfilms |