Cratering Induced by Slow Highly Charged Ions on Ultrathin PMMA Films

Highly charged ions are a well-known tool for the nanostructuring of surfaces. We report on the thickness dependence of nanostructures produced by single 260 keV Xe<sup>38+</sup> ions on ultrathin poly(methyl methacrylate) (PMMA) films (1 nm to 60 nm) deposited onto Si substrates. The na...

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Main Authors: Raquel S. Thomaz, Philipp Ernst, Pedro L. Grande, Marika Schleberger, Ricardo M. Papaléo
Format: Article
Language:English
Published: MDPI AG 2022-09-01
Series:Atoms
Subjects:
Online Access:https://www.mdpi.com/2218-2004/10/4/96
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author Raquel S. Thomaz
Philipp Ernst
Pedro L. Grande
Marika Schleberger
Ricardo M. Papaléo
author_facet Raquel S. Thomaz
Philipp Ernst
Pedro L. Grande
Marika Schleberger
Ricardo M. Papaléo
author_sort Raquel S. Thomaz
collection DOAJ
description Highly charged ions are a well-known tool for the nanostructuring of surfaces. We report on the thickness dependence of nanostructures produced by single 260 keV Xe<sup>38+</sup> ions on ultrathin poly(methyl methacrylate) (PMMA) films (1 nm to 60 nm) deposited onto Si substrates. The nanostructures induced by slow highly charged ions are rimless craters with a diameter of around 15 nm, which are roughly independent of the thickness of the films down to layers of about 2 nm. The crater depth and thus the overall crater volume are, however, thickness-dependent, decreasing in size in films thinner than ~25 nm. Our findings indicate that although the potential energy of the highly charged ions is the predominant source of deposited energy, the depth of the excited material contributing to crater formation is much larger than the neutralization depth of the ions, which occurs in the first nanometer of the solid at the projectile velocity employed here. This suggests synergism between kinetic and potential-driven processes in nanostructure formation in PMMA.
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spelling doaj.art-f0900609671e4485b85ef5a22ee9fed72023-11-24T13:13:32ZengMDPI AGAtoms2218-20042022-09-011049610.3390/atoms10040096Cratering Induced by Slow Highly Charged Ions on Ultrathin PMMA FilmsRaquel S. Thomaz0Philipp Ernst1Pedro L. Grande2Marika Schleberger3Ricardo M. Papaléo4Interdisciplinary Center of Nanoscience and Micro-Nanotechnology, School of Technology, Pontifical Catholic University of Rio Grande do Sul, Av. Ipiranga, 6681, Porto Alegre CEP 90619-900, RS, BrazilFakultät für Physik and CENIDE, Universität Duisburg-Essen, 47048 Duisburg, GermanyInstitute of Physics, Federal University of Rio Grande do Sul, Av. Bento Gonçalves, 9500, Porto Alegre CEP 90650-970, RS, BrazilFakultät für Physik and CENIDE, Universität Duisburg-Essen, 47048 Duisburg, GermanyInterdisciplinary Center of Nanoscience and Micro-Nanotechnology, School of Technology, Pontifical Catholic University of Rio Grande do Sul, Av. Ipiranga, 6681, Porto Alegre CEP 90619-900, RS, BrazilHighly charged ions are a well-known tool for the nanostructuring of surfaces. We report on the thickness dependence of nanostructures produced by single 260 keV Xe<sup>38+</sup> ions on ultrathin poly(methyl methacrylate) (PMMA) films (1 nm to 60 nm) deposited onto Si substrates. The nanostructures induced by slow highly charged ions are rimless craters with a diameter of around 15 nm, which are roughly independent of the thickness of the films down to layers of about 2 nm. The crater depth and thus the overall crater volume are, however, thickness-dependent, decreasing in size in films thinner than ~25 nm. Our findings indicate that although the potential energy of the highly charged ions is the predominant source of deposited energy, the depth of the excited material contributing to crater formation is much larger than the neutralization depth of the ions, which occurs in the first nanometer of the solid at the projectile velocity employed here. This suggests synergism between kinetic and potential-driven processes in nanostructure formation in PMMA.https://www.mdpi.com/2218-2004/10/4/96slow highly charged ionsnanostructuresradiation effectssingle-ion impactspolymer thin filmsPMMA
spellingShingle Raquel S. Thomaz
Philipp Ernst
Pedro L. Grande
Marika Schleberger
Ricardo M. Papaléo
Cratering Induced by Slow Highly Charged Ions on Ultrathin PMMA Films
Atoms
slow highly charged ions
nanostructures
radiation effects
single-ion impacts
polymer thin films
PMMA
title Cratering Induced by Slow Highly Charged Ions on Ultrathin PMMA Films
title_full Cratering Induced by Slow Highly Charged Ions on Ultrathin PMMA Films
title_fullStr Cratering Induced by Slow Highly Charged Ions on Ultrathin PMMA Films
title_full_unstemmed Cratering Induced by Slow Highly Charged Ions on Ultrathin PMMA Films
title_short Cratering Induced by Slow Highly Charged Ions on Ultrathin PMMA Films
title_sort cratering induced by slow highly charged ions on ultrathin pmma films
topic slow highly charged ions
nanostructures
radiation effects
single-ion impacts
polymer thin films
PMMA
url https://www.mdpi.com/2218-2004/10/4/96
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AT marikaschleberger crateringinducedbyslowhighlychargedionsonultrathinpmmafilms
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