Physical and Electrical Properties of Yttria-Stabilized Zirconia Thin Films Prepared by Radio Frequency Magnetron Sputtering

This paper presents the electrophysical characteristics of a 7 mol.% yttria-stabilized zirconia (YSZ) thin film deposited by radio-frequency magnetron sputtering. In order to form the crystallinestructure, the deposited films were annealed in air over a temperature range of 700 ÷ 900 °C. By XRD anal...

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Main Authors: Dmitriy A. Golosov, Sergey M. Zavatskiy, Sergey N. Melnikov
Format: Article
Language:English
Published: CTU Central Library 2013-01-01
Series:Acta Polytechnica
Subjects:
Online Access:https://ojs.cvut.cz/ojs/index.php/ap/article/view/1743
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author Dmitriy A. Golosov
Sergey M. Zavatskiy
Sergey N. Melnikov
author_facet Dmitriy A. Golosov
Sergey M. Zavatskiy
Sergey N. Melnikov
author_sort Dmitriy A. Golosov
collection DOAJ
description This paper presents the electrophysical characteristics of a 7 mol.% yttria-stabilized zirconia (YSZ) thin film deposited by radio-frequency magnetron sputtering. In order to form the crystallinestructure, the deposited films were annealed in air over a temperature range of 700 ÷ 900 °C. By XRD analysis it was established that as the deposited films were amorphous, they crystallized into a pure cubic structure as a result of annealing in air at a temperature above 820 °C.The electrophysical properties of YSZ films were investigated on structures such¨as Ni/YSZ/Pt/Ti/Si and Ni/YSZ/Si. Film features ? &gt; 20 and tg ? &lt; 0.05 were obtained. An estimate of the capacity-voltage characteristic proved that the Ni/YSZ/Si structures possessed a hysteresis. This hysteresis resulted from the drift of the mobile ions in the YSZ film. High-temperature ionic conductivity of the stabilized zirconia was determined by the measurements of the electric resistivity of the YSZ films at 1 kHz over the temperature range from ambient to 800 °C. The YSZ film conductivity obtained was 1.96 × 10<sup>-2</sup> S/cm under 800 °C.
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spelling doaj.art-f174a03e163941f6a7d0f22d18bf42c22022-12-21T18:22:28ZengCTU Central LibraryActa Polytechnica1210-27091805-23632013-01-015321743Physical and Electrical Properties of Yttria-Stabilized Zirconia Thin Films Prepared by Radio Frequency Magnetron SputteringDmitriy A. GolosovSergey M. ZavatskiySergey N. MelnikovThis paper presents the electrophysical characteristics of a 7 mol.% yttria-stabilized zirconia (YSZ) thin film deposited by radio-frequency magnetron sputtering. In order to form the crystallinestructure, the deposited films were annealed in air over a temperature range of 700 ÷ 900 °C. By XRD analysis it was established that as the deposited films were amorphous, they crystallized into a pure cubic structure as a result of annealing in air at a temperature above 820 °C.The electrophysical properties of YSZ films were investigated on structures such¨as Ni/YSZ/Pt/Ti/Si and Ni/YSZ/Si. Film features ? &gt; 20 and tg ? &lt; 0.05 were obtained. An estimate of the capacity-voltage characteristic proved that the Ni/YSZ/Si structures possessed a hysteresis. This hysteresis resulted from the drift of the mobile ions in the YSZ film. High-temperature ionic conductivity of the stabilized zirconia was determined by the measurements of the electric resistivity of the YSZ films at 1 kHz over the temperature range from ambient to 800 °C. The YSZ film conductivity obtained was 1.96 × 10<sup>-2</sup> S/cm under 800 °C.https://ojs.cvut.cz/ojs/index.php/ap/article/view/1743yttria-stabilized zirconiaRF sputteringX-ray diffractiondielectric constantloss tangentcapacity-voltage characteristicionic conductivity.
spellingShingle Dmitriy A. Golosov
Sergey M. Zavatskiy
Sergey N. Melnikov
Physical and Electrical Properties of Yttria-Stabilized Zirconia Thin Films Prepared by Radio Frequency Magnetron Sputtering
Acta Polytechnica
yttria-stabilized zirconia
RF sputtering
X-ray diffraction
dielectric constant
loss tangent
capacity-voltage characteristic
ionic conductivity.
title Physical and Electrical Properties of Yttria-Stabilized Zirconia Thin Films Prepared by Radio Frequency Magnetron Sputtering
title_full Physical and Electrical Properties of Yttria-Stabilized Zirconia Thin Films Prepared by Radio Frequency Magnetron Sputtering
title_fullStr Physical and Electrical Properties of Yttria-Stabilized Zirconia Thin Films Prepared by Radio Frequency Magnetron Sputtering
title_full_unstemmed Physical and Electrical Properties of Yttria-Stabilized Zirconia Thin Films Prepared by Radio Frequency Magnetron Sputtering
title_short Physical and Electrical Properties of Yttria-Stabilized Zirconia Thin Films Prepared by Radio Frequency Magnetron Sputtering
title_sort physical and electrical properties of yttria stabilized zirconia thin films prepared by radio frequency magnetron sputtering
topic yttria-stabilized zirconia
RF sputtering
X-ray diffraction
dielectric constant
loss tangent
capacity-voltage characteristic
ionic conductivity.
url https://ojs.cvut.cz/ojs/index.php/ap/article/view/1743
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AT sergeymzavatskiy physicalandelectricalpropertiesofyttriastabilizedzirconiathinfilmspreparedbyradiofrequencymagnetronsputtering
AT sergeynmelnikov physicalandelectricalpropertiesofyttriastabilizedzirconiathinfilmspreparedbyradiofrequencymagnetronsputtering