A new Dual-Vt 4T SRAM bitcell design
Reducing the memory bit cell area by reducing the number of transistors is a relatively straightforward solution to achieving a high density SRAM design. In the design of critical SRAM cells, the stability characteristics exhibited by different operating states are important criteria for judging the...
Main Authors: | Zhang Luxuan, Qiao Shushan, Hao Xudan |
---|---|
Format: | Article |
Language: | zho |
Published: |
National Computer System Engineering Research Institute of China
2018-11-01
|
Series: | Dianzi Jishu Yingyong |
Subjects: | |
Online Access: | http://www.chinaaet.com/article/3000093342 |
Similar Items
-
Analyzing Sub-Threshold Bitcell Topologies and the Effects of Assist Methods on SRAM V<sub>MIN</sub>
by: James Boley, et al.
Published: (2012-04-01) -
Energy-Efficient Dual-Node-Upset-Recoverable 12T SRAM for Low-Power Aerospace Applications
by: Soumitra Pal, et al.
Published: (2023-01-01) -
Bitline Charge Sharing Suppressed Bitline and Cell Supply Collapse Assists for Energy-Efficient 6T SRAM
by: Kiryong Kim, et al.
Published: (2021-01-01) -
Low Leakage and Robust Sub-threshold SRAM Cell Using Memristor
by: Zeba Mustaqueem, et al.
Published: (2022-12-01) -
Design of low power SRAM cells with increased read and write performance using Read - Write assist technique
by: M. Srinu, et al.
Published: (2024-03-01)