Structural, optical, and electrical properties of V2O5 thin films: Nitrogen implantation and the role of different substrates
This report investigates the effect of substrate and nitrogen (16 keV N+) ion implantation on the structural, morphological, compositional, and electrical properties of V2O5 thin films which are grown by thermal evaporation on various substrates, including glass, Si, and sapphire (termed V2O5:Gl, V2...
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| Format: | Article |
| Language: | English |
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Frontiers Media S.A.
2022-12-01
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| Series: | Frontiers in Materials |
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| Online Access: | https://www.frontiersin.org/articles/10.3389/fmats.2022.1049189/full |
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| author | Bhanu Priya Priya Jasrotia Arun Kumar Vinamrita Singh Jehova Jire L. Hmar Raj Kumar Pawan Kumar Kulriya Tanuj Kumar |
| author_facet | Bhanu Priya Priya Jasrotia Arun Kumar Vinamrita Singh Jehova Jire L. Hmar Raj Kumar Pawan Kumar Kulriya Tanuj Kumar |
| author_sort | Bhanu Priya |
| collection | DOAJ |
| description | This report investigates the effect of substrate and nitrogen (16 keV N+) ion implantation on the structural, morphological, compositional, and electrical properties of V2O5 thin films which are grown by thermal evaporation on various substrates, including glass, Si, and sapphire (termed V2O5:Gl, V2O5:Si, and V2O5:Sp, respectively). Structural analysis showed the formation of the mixed (α, and β-V2O5) phases on all substrates; however, the β-V2O5 phase is highly dominant in the V2O5:G and V2O5:Si samples. A deformation in the β-phase of V2O5 thin film under ion implantation-induced strain results in a change of crystallite size. Irradiation suppresses XRD peaks in relative intensities, indicating partial amorphization of the film with defect formation. Microstructural analysis confirmed the formation of uniform-sized nanorods for V2O5:Si, whereas isolated crystallites were formed for other types of substrates. Thermal conductivity may influence the size and shapes of V2O5 crystallite forms on different surfaces. Silicon absorbs heat more effectively than sapphire or glass, resulting in nanorod formation. A decrease in optical bandgap and electrical conduction has been observed due to increased oxygen vacancies, induced electron scattering, and trapping centres on N+ implantation. The present study thus offers the unique advantage of simultaneous reduction in optical band-gap and conductance of V2O5 thin films, which is important for optoelectronic applications. |
| first_indexed | 2024-04-11T12:54:31Z |
| format | Article |
| id | doaj.art-f2a8ecc1eed443e59c26eba94de24916 |
| institution | Directory Open Access Journal |
| issn | 2296-8016 |
| language | English |
| last_indexed | 2024-04-11T12:54:31Z |
| publishDate | 2022-12-01 |
| publisher | Frontiers Media S.A. |
| record_format | Article |
| series | Frontiers in Materials |
| spelling | doaj.art-f2a8ecc1eed443e59c26eba94de249162022-12-22T04:23:07ZengFrontiers Media S.A.Frontiers in Materials2296-80162022-12-01910.3389/fmats.2022.10491891049189Structural, optical, and electrical properties of V2O5 thin films: Nitrogen implantation and the role of different substratesBhanu Priya0Priya Jasrotia1Arun Kumar2Vinamrita Singh3Jehova Jire L. Hmar4Raj Kumar5Pawan Kumar Kulriya6Tanuj Kumar7Department of Nanoscience and Materials, Central University of Jammu, Jammu, IndiaDepartment of Nanoscience and Materials, Central University of Jammu, Jammu, IndiaDepartment of Physics, J.C. Bose University of Science and Technology, YMCA, Faridabad, IndiaDepartment of Physics, Netaji Subhas University of Technology, Delhi, IndiaDepartment of Physics, Netaji Subhas University of Technology, Delhi, IndiaInter University Accelerator Centre, Aruna Asif Ali Marg, New Delhi, IndiaDepartment of Physical Sciences, Jawaharlal Nehru University, New Delhi, IndiaDepartment of Nanoscience and Materials, Central University of Jammu, Jammu, IndiaThis report investigates the effect of substrate and nitrogen (16 keV N+) ion implantation on the structural, morphological, compositional, and electrical properties of V2O5 thin films which are grown by thermal evaporation on various substrates, including glass, Si, and sapphire (termed V2O5:Gl, V2O5:Si, and V2O5:Sp, respectively). Structural analysis showed the formation of the mixed (α, and β-V2O5) phases on all substrates; however, the β-V2O5 phase is highly dominant in the V2O5:G and V2O5:Si samples. A deformation in the β-phase of V2O5 thin film under ion implantation-induced strain results in a change of crystallite size. Irradiation suppresses XRD peaks in relative intensities, indicating partial amorphization of the film with defect formation. Microstructural analysis confirmed the formation of uniform-sized nanorods for V2O5:Si, whereas isolated crystallites were formed for other types of substrates. Thermal conductivity may influence the size and shapes of V2O5 crystallite forms on different surfaces. Silicon absorbs heat more effectively than sapphire or glass, resulting in nanorod formation. A decrease in optical bandgap and electrical conduction has been observed due to increased oxygen vacancies, induced electron scattering, and trapping centres on N+ implantation. The present study thus offers the unique advantage of simultaneous reduction in optical band-gap and conductance of V2O5 thin films, which is important for optoelectronic applications.https://www.frontiersin.org/articles/10.3389/fmats.2022.1049189/fullion implantationcrystallitemicroscopyconductancenanorod |
| spellingShingle | Bhanu Priya Priya Jasrotia Arun Kumar Vinamrita Singh Jehova Jire L. Hmar Raj Kumar Pawan Kumar Kulriya Tanuj Kumar Structural, optical, and electrical properties of V2O5 thin films: Nitrogen implantation and the role of different substrates Frontiers in Materials ion implantation crystallite microscopy conductance nanorod |
| title | Structural, optical, and electrical properties of V2O5 thin films: Nitrogen implantation and the role of different substrates |
| title_full | Structural, optical, and electrical properties of V2O5 thin films: Nitrogen implantation and the role of different substrates |
| title_fullStr | Structural, optical, and electrical properties of V2O5 thin films: Nitrogen implantation and the role of different substrates |
| title_full_unstemmed | Structural, optical, and electrical properties of V2O5 thin films: Nitrogen implantation and the role of different substrates |
| title_short | Structural, optical, and electrical properties of V2O5 thin films: Nitrogen implantation and the role of different substrates |
| title_sort | structural optical and electrical properties of v2o5 thin films nitrogen implantation and the role of different substrates |
| topic | ion implantation crystallite microscopy conductance nanorod |
| url | https://www.frontiersin.org/articles/10.3389/fmats.2022.1049189/full |
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