Ferroelectric gate tunnel field-effect transistors with low-power steep turn-on

Using a ferroelectric PbZrTiO3 gate stack, the range of the steep subthreshold swing in tunnel field-effect transistors was extended by 3.5 orders of magnitude demonstrating an improvement in the swing (by approximately double the slope). The drain conductance (gd) shows only 16% enhancement with la...

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Main Authors: M. H. Lee, Y.-T. Wei, J.-C. Lin, C.-W. Chen, W.-H. Tu, M. Tang
Format: Article
Language:English
Published: AIP Publishing LLC 2014-10-01
Series:AIP Advances
Online Access:http://dx.doi.org/10.1063/1.4898150
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author M. H. Lee
Y.-T. Wei
J.-C. Lin
C.-W. Chen
W.-H. Tu
M. Tang
author_facet M. H. Lee
Y.-T. Wei
J.-C. Lin
C.-W. Chen
W.-H. Tu
M. Tang
author_sort M. H. Lee
collection DOAJ
description Using a ferroelectric PbZrTiO3 gate stack, the range of the steep subthreshold swing in tunnel field-effect transistors was extended by 3.5 orders of magnitude demonstrating an improvement in the swing (by approximately double the slope). The drain conductance (gd) shows only 16% enhancement with large V DS (∼−1.5V) indicates internal voltage amplification with ferroelectric negative capacitance effect beneficial to small lateral drain-source bias voltages (−0.1 V). The concept of coupling the ferroelectric polarization is proposed. The power consumption is also discussed in low-power applications of steep subthreshold slope devices.
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spelling doaj.art-f372433118324acc889ec8de2c35c8ee2022-12-21T18:36:46ZengAIP Publishing LLCAIP Advances2158-32262014-10-01410107117107117-610.1063/1.4898150019410ADVFerroelectric gate tunnel field-effect transistors with low-power steep turn-onM. H. Lee0Y.-T. Wei1J.-C. Lin2C.-W. Chen3W.-H. Tu4M. Tang5Institute of Electro-Optical Science and Technology, National Taiwan Normal University, Taipei, TaiwanInstitute of Electro-Optical Science and Technology, National Taiwan Normal University, Taipei, TaiwanInstitute of Electro-Optical Science and Technology, National Taiwan Normal University, Taipei, TaiwanInstitute of Microelectronics, National Cheng Kung University, Tainan, TaiwanDepartment of Electrical Engineering and Graduate Institute of Electronics Engineering, National Taiwan University, Taipei, TaiwanDevice Design Division, PTEK Technology Co., Ltd, Hsinchu, TaiwanUsing a ferroelectric PbZrTiO3 gate stack, the range of the steep subthreshold swing in tunnel field-effect transistors was extended by 3.5 orders of magnitude demonstrating an improvement in the swing (by approximately double the slope). The drain conductance (gd) shows only 16% enhancement with large V DS (∼−1.5V) indicates internal voltage amplification with ferroelectric negative capacitance effect beneficial to small lateral drain-source bias voltages (−0.1 V). The concept of coupling the ferroelectric polarization is proposed. The power consumption is also discussed in low-power applications of steep subthreshold slope devices.http://dx.doi.org/10.1063/1.4898150
spellingShingle M. H. Lee
Y.-T. Wei
J.-C. Lin
C.-W. Chen
W.-H. Tu
M. Tang
Ferroelectric gate tunnel field-effect transistors with low-power steep turn-on
AIP Advances
title Ferroelectric gate tunnel field-effect transistors with low-power steep turn-on
title_full Ferroelectric gate tunnel field-effect transistors with low-power steep turn-on
title_fullStr Ferroelectric gate tunnel field-effect transistors with low-power steep turn-on
title_full_unstemmed Ferroelectric gate tunnel field-effect transistors with low-power steep turn-on
title_short Ferroelectric gate tunnel field-effect transistors with low-power steep turn-on
title_sort ferroelectric gate tunnel field effect transistors with low power steep turn on
url http://dx.doi.org/10.1063/1.4898150
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