UV Nanoimprint Lithography: Geometrical Impact on Filling Properties of Nanoscale Patterns
Ultraviolet (UV) Nanoimprint Lithography (NIL) is a replication method that is well known for its capability to address a wide range of pattern sizes and shapes. It has proven to be an efficient production method for patterning resist layers with features ranging from a few hundred micrometers and d...
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| Format: | Article |
| Language: | English |
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MDPI AG
2021-03-01
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| Series: | Nanomaterials |
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| Online Access: | https://www.mdpi.com/2079-4991/11/3/822 |
| _version_ | 1827696957631496192 |
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| author | Christine Thanner Martin Eibelhuber |
| author_facet | Christine Thanner Martin Eibelhuber |
| author_sort | Christine Thanner |
| collection | DOAJ |
| description | Ultraviolet (UV) Nanoimprint Lithography (NIL) is a replication method that is well known for its capability to address a wide range of pattern sizes and shapes. It has proven to be an efficient production method for patterning resist layers with features ranging from a few hundred micrometers and down to the nanometer range. Best results can be achieved if the fundamental behavior of the imprint resist and the pattern filling are considered by the equipment and process parameters. In particular, the material properties and pattern size and shape play a crucial role. For capillary force-driven filling behavior it is important to understand the influencing parameters and respective failure modes in order to optimize the processes for reliable full wafer manufacturing. In this work, the nanoimprint results obtained for different pattern geometries are compared with respect to pattern quality and residual layer thickness: The comprehensive overview of the relevant process parameters is helpful for setting up NIL processes for different nanostructures with minimum layer thickness. |
| first_indexed | 2024-03-10T12:59:31Z |
| format | Article |
| id | doaj.art-f3c3602f86ca4baf9b760a820765d65d |
| institution | Directory Open Access Journal |
| issn | 2079-4991 |
| language | English |
| last_indexed | 2024-03-10T12:59:31Z |
| publishDate | 2021-03-01 |
| publisher | MDPI AG |
| record_format | Article |
| series | Nanomaterials |
| spelling | doaj.art-f3c3602f86ca4baf9b760a820765d65d2023-11-21T11:41:36ZengMDPI AGNanomaterials2079-49912021-03-0111382210.3390/nano11030822UV Nanoimprint Lithography: Geometrical Impact on Filling Properties of Nanoscale PatternsChristine Thanner0Martin Eibelhuber1EV Group, DI Erich Thallner Str. 1, 4782 St. Florian am Inn, AustriaEV Group, DI Erich Thallner Str. 1, 4782 St. Florian am Inn, AustriaUltraviolet (UV) Nanoimprint Lithography (NIL) is a replication method that is well known for its capability to address a wide range of pattern sizes and shapes. It has proven to be an efficient production method for patterning resist layers with features ranging from a few hundred micrometers and down to the nanometer range. Best results can be achieved if the fundamental behavior of the imprint resist and the pattern filling are considered by the equipment and process parameters. In particular, the material properties and pattern size and shape play a crucial role. For capillary force-driven filling behavior it is important to understand the influencing parameters and respective failure modes in order to optimize the processes for reliable full wafer manufacturing. In this work, the nanoimprint results obtained for different pattern geometries are compared with respect to pattern quality and residual layer thickness: The comprehensive overview of the relevant process parameters is helpful for setting up NIL processes for different nanostructures with minimum layer thickness.https://www.mdpi.com/2079-4991/11/3/822nanoimprint lithographyUV-NILSmartNIL |
| spellingShingle | Christine Thanner Martin Eibelhuber UV Nanoimprint Lithography: Geometrical Impact on Filling Properties of Nanoscale Patterns Nanomaterials nanoimprint lithography UV-NIL SmartNIL |
| title | UV Nanoimprint Lithography: Geometrical Impact on Filling Properties of Nanoscale Patterns |
| title_full | UV Nanoimprint Lithography: Geometrical Impact on Filling Properties of Nanoscale Patterns |
| title_fullStr | UV Nanoimprint Lithography: Geometrical Impact on Filling Properties of Nanoscale Patterns |
| title_full_unstemmed | UV Nanoimprint Lithography: Geometrical Impact on Filling Properties of Nanoscale Patterns |
| title_short | UV Nanoimprint Lithography: Geometrical Impact on Filling Properties of Nanoscale Patterns |
| title_sort | uv nanoimprint lithography geometrical impact on filling properties of nanoscale patterns |
| topic | nanoimprint lithography UV-NIL SmartNIL |
| url | https://www.mdpi.com/2079-4991/11/3/822 |
| work_keys_str_mv | AT christinethanner uvnanoimprintlithographygeometricalimpactonfillingpropertiesofnanoscalepatterns AT martineibelhuber uvnanoimprintlithographygeometricalimpactonfillingpropertiesofnanoscalepatterns |