Ion Beam Modification for Si Photonics

Ion implantation has played a significant role in semiconductor device fabrication and is growing in significance in the fabrication of Si photonic devices. In this paper, recent progress in the growth and characterization of Si and Ge quantum dots (QDs) for photonic light-emitting devices is review...

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Main Authors: Lyudmila V. Goncharova, Peter J. Simpson
Format: Article
Language:English
Published: MDPI AG 2022-03-01
Series:Physics
Subjects:
Online Access:https://www.mdpi.com/2624-8174/4/2/25
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author Lyudmila V. Goncharova
Peter J. Simpson
author_facet Lyudmila V. Goncharova
Peter J. Simpson
author_sort Lyudmila V. Goncharova
collection DOAJ
description Ion implantation has played a significant role in semiconductor device fabrication and is growing in significance in the fabrication of Si photonic devices. In this paper, recent progress in the growth and characterization of Si and Ge quantum dots (QDs) for photonic light-emitting devices is reviewed, with a focus on ion implantation as a synthetic tool. Light emissions from Si and Ge QDs are compared with emissions from other optically active centers, such as defects in silicon oxide and other thin film materials, as well as rare-earth light emitters. Detection of light in silicon photonics is performed via the integration of germanium and other elements into detector structures, which can also be achieved by ion implantation. Novel techniques to grow SiGe- and SiGeSn-on-Si structure are described along with their application as detectors for operation in the short-wave infrared range.
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spelling doaj.art-f5261e2eb276464db95b845a5b641d742023-11-23T18:33:40ZengMDPI AGPhysics2624-81742022-03-014238339310.3390/physics4020025Ion Beam Modification for Si PhotonicsLyudmila V. Goncharova0Peter J. Simpson1Department of Physics and Astronomy, Western University, London, ON N6A 3K7, CanadaDepartment of Physics and Astronomy, Western University, London, ON N6A 3K7, CanadaIon implantation has played a significant role in semiconductor device fabrication and is growing in significance in the fabrication of Si photonic devices. In this paper, recent progress in the growth and characterization of Si and Ge quantum dots (QDs) for photonic light-emitting devices is reviewed, with a focus on ion implantation as a synthetic tool. Light emissions from Si and Ge QDs are compared with emissions from other optically active centers, such as defects in silicon oxide and other thin film materials, as well as rare-earth light emitters. Detection of light in silicon photonics is performed via the integration of germanium and other elements into detector structures, which can also be achieved by ion implantation. Novel techniques to grow SiGe- and SiGeSn-on-Si structure are described along with their application as detectors for operation in the short-wave infrared range.https://www.mdpi.com/2624-8174/4/2/25Si photonicsion beam implantationquantum dotsshort-wave infrared detectors
spellingShingle Lyudmila V. Goncharova
Peter J. Simpson
Ion Beam Modification for Si Photonics
Physics
Si photonics
ion beam implantation
quantum dots
short-wave infrared detectors
title Ion Beam Modification for Si Photonics
title_full Ion Beam Modification for Si Photonics
title_fullStr Ion Beam Modification for Si Photonics
title_full_unstemmed Ion Beam Modification for Si Photonics
title_short Ion Beam Modification for Si Photonics
title_sort ion beam modification for si photonics
topic Si photonics
ion beam implantation
quantum dots
short-wave infrared detectors
url https://www.mdpi.com/2624-8174/4/2/25
work_keys_str_mv AT lyudmilavgoncharova ionbeammodificationforsiphotonics
AT peterjsimpson ionbeammodificationforsiphotonics