Strained Silicon Single Nanowire Gate-All-Around TFETs with Optimized Tunneling Junctions

In this work, we demonstrate a strained Si single nanowire tunnel field effect transistor (TFET) with gate-all-around (GAA) structure yielding Ion-current of 15 μA/μm at the supply voltage of Vdd = 0.5V with linear onset at low drain voltages. The subthreshold swing (SS) at room temperature shows an...

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Main Authors: Keyvan Narimani, Stefan Trellenkamp, Andreas Tiedemann, Siegfried Mantl, Qing-Tai Zhao
Format: Article
Language:English
Published: MDPI AG 2018-04-01
Series:Applied Sciences
Subjects:
Online Access:http://www.mdpi.com/2076-3417/8/5/670
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author Keyvan Narimani
Stefan Trellenkamp
Andreas Tiedemann
Siegfried Mantl
Qing-Tai Zhao
author_facet Keyvan Narimani
Stefan Trellenkamp
Andreas Tiedemann
Siegfried Mantl
Qing-Tai Zhao
author_sort Keyvan Narimani
collection DOAJ
description In this work, we demonstrate a strained Si single nanowire tunnel field effect transistor (TFET) with gate-all-around (GAA) structure yielding Ion-current of 15 μA/μm at the supply voltage of Vdd = 0.5V with linear onset at low drain voltages. The subthreshold swing (SS) at room temperature shows an average of 76 mV/dec over 4 orders of drain current Id from 5 × 10−6 to 5 × 10−2 µA/µm Optimized devices also show excellent current saturation, an important feature for analog performance.
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spelling doaj.art-f61069d4295549c09c30f8e82b61ad392022-12-22T02:24:01ZengMDPI AGApplied Sciences2076-34172018-04-018567010.3390/app8050670app8050670Strained Silicon Single Nanowire Gate-All-Around TFETs with Optimized Tunneling JunctionsKeyvan Narimani0Stefan Trellenkamp1Andreas Tiedemann2Siegfried Mantl3Qing-Tai Zhao4Peter-Grünberg-Institute (PGI 9), JARA-Fundamentals for Future Technology, Forschungszentrum Jülich, 52428 Jülich, GermanyHNF, Forschungszentrum Jülich, 52428 Jülich, GermanyPeter-Grünberg-Institute (PGI 9), JARA-Fundamentals for Future Technology, Forschungszentrum Jülich, 52428 Jülich, GermanyPeter-Grünberg-Institute (PGI 9), JARA-Fundamentals for Future Technology, Forschungszentrum Jülich, 52428 Jülich, GermanyPeter-Grünberg-Institute (PGI 9), JARA-Fundamentals for Future Technology, Forschungszentrum Jülich, 52428 Jülich, GermanyIn this work, we demonstrate a strained Si single nanowire tunnel field effect transistor (TFET) with gate-all-around (GAA) structure yielding Ion-current of 15 μA/μm at the supply voltage of Vdd = 0.5V with linear onset at low drain voltages. The subthreshold swing (SS) at room temperature shows an average of 76 mV/dec over 4 orders of drain current Id from 5 × 10−6 to 5 × 10−2 µA/µm Optimized devices also show excellent current saturation, an important feature for analog performance.http://www.mdpi.com/2076-3417/8/5/670tunnel field effect transistor (TFET)band-to-band tunneling (BTBT)trap-assisted tunneling (TAT)gate-all-around (GAA) nanowires (NWs)
spellingShingle Keyvan Narimani
Stefan Trellenkamp
Andreas Tiedemann
Siegfried Mantl
Qing-Tai Zhao
Strained Silicon Single Nanowire Gate-All-Around TFETs with Optimized Tunneling Junctions
Applied Sciences
tunnel field effect transistor (TFET)
band-to-band tunneling (BTBT)
trap-assisted tunneling (TAT)
gate-all-around (GAA) nanowires (NWs)
title Strained Silicon Single Nanowire Gate-All-Around TFETs with Optimized Tunneling Junctions
title_full Strained Silicon Single Nanowire Gate-All-Around TFETs with Optimized Tunneling Junctions
title_fullStr Strained Silicon Single Nanowire Gate-All-Around TFETs with Optimized Tunneling Junctions
title_full_unstemmed Strained Silicon Single Nanowire Gate-All-Around TFETs with Optimized Tunneling Junctions
title_short Strained Silicon Single Nanowire Gate-All-Around TFETs with Optimized Tunneling Junctions
title_sort strained silicon single nanowire gate all around tfets with optimized tunneling junctions
topic tunnel field effect transistor (TFET)
band-to-band tunneling (BTBT)
trap-assisted tunneling (TAT)
gate-all-around (GAA) nanowires (NWs)
url http://www.mdpi.com/2076-3417/8/5/670
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AT siegfriedmantl strainedsiliconsinglenanowiregateallaroundtfetswithoptimizedtunnelingjunctions
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