Effect of the Deposit Temperature of ZnO Doped with Ni by HFCVD

Effect of the Deposit Temperature of ZnO Doped with Ni by HFCVD

The effect of the deposit temperature of zinc oxide (ZnO) doped with nickel (Ni) by hot filament chemical vapor deposition (HFCVD) technique is reported in this work. The technique allows depositing ZnO:Ni in short intervals (1 min). A deposit of undoped ZnO is used as a reference sample. The refere...

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Bibliographic Details
Main Authors: Delfino R. Gutiérrez, Godofredo García-Salgado, Antonio Coyopol, Enrique Rosendo-Andrés, Román Romano, Crisóforo Morales, Alfredo Benítez, Francisco Severiano, Ana María Herrera, Francisco Ramírez-González
Format: Article
Language:English
Published: MDPI AG 2023-02-01
Series:Materials
Subjects:
HFCVD technique
zinc oxide
nickel
dopant
temperature
Online Access:https://www.mdpi.com/1996-1944/16/4/1526

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