Ordered phase formation in Sm-Ni thin film deposited on Cr(100) single-crystal underlayer

Sm17Ni83 (at. %) alloy thin films are prepared on Cr(100) underlayers hetero-epitaxially grown on MgO(100) single-crystal substrates by employing an ultra-high vacuum molecular beam epitaxy system. The effect of substrate temperature on the ordered phase formation is investigated. The films deposite...

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Bibliographic Details
Main Authors: Hotta Yusuke, Yamada Makoto, Yanagawa Takato, Ohtake Mitsuru, Kirino Fumiyoshi, Inaba Nobuyuki, Futamoto Masaaki
Format: Article
Language:English
Published: EDP Sciences 2014-07-01
Series:EPJ Web of Conferences
Online Access:http://dx.doi.org/10.1051/epjconf/20147504009
Description
Summary:Sm17Ni83 (at. %) alloy thin films are prepared on Cr(100) underlayers hetero-epitaxially grown on MgO(100) single-crystal substrates by employing an ultra-high vacuum molecular beam epitaxy system. The effect of substrate temperature on the ordered phase formation is investigated. The films deposited below 300 °C consist of amorphous phase, whereas formation of SmNi5 ordered phase is recognized for the films deposited above 400 °C. The SmNi5 films with ordered phase consist of two types of (112¯$\bar 2$0) variant whose c-axes are lying in the film plane and rotated around the film normal by 90° each other. With increasing the temperature from 400 to 500 °C, the long-range order degree increases from 0.65 to 0.80. The ordered film formed at 500 °C shows an in-plane magnetic anisotropy reflecting the magnetocrystalline anisotropy of SmNi5 crystal.
ISSN:2100-014X