Manufacture of Micromirror Arrays Using a CMOS-MEMS Technique
In this study we used the commercial 0.35 µm CMOS (complementary metal oxide semiconductor) process and simple maskless post-processing to fabricate an array of micromirrors exhibiting high natural frequency. The micromirrors were manufactured from aluminum; the sacrificial layer was silicon dioxide...
| Main Authors: | , , , |
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| Format: | Article |
| Language: | English |
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MDPI AG
2009-08-01
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| Series: | Sensors |
| Subjects: | |
| Online Access: | http://www.mdpi.com/1424-8220/9/8/6219/ |
| _version_ | 1818037442875228160 |
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| author | Chyan-Chyi Wu Ching-Liang Dai Cheng-Chih Hsu Pin-Hsu Kao |
| author_facet | Chyan-Chyi Wu Ching-Liang Dai Cheng-Chih Hsu Pin-Hsu Kao |
| author_sort | Chyan-Chyi Wu |
| collection | DOAJ |
| description | In this study we used the commercial 0.35 µm CMOS (complementary metal oxide semiconductor) process and simple maskless post-processing to fabricate an array of micromirrors exhibiting high natural frequency. The micromirrors were manufactured from aluminum; the sacrificial layer was silicon dioxide. Because we fabricated the micromirror arrays using the standard CMOS process, they have the potential to be integrated with circuitry on a chip. For post-processing we used an etchant to remove the sacrificial layer and thereby suspend the micromirrors. The micromirror array contained a circular membrane and four fixed beams set symmetrically around and below the circular mirror; these four fan-shaped electrodes controlled the tilting of the micromirror. A MEMS (microelectromechanical system) motion analysis system and a confocal 3D-surface topography were used to characterize the properties and configuration of the micromirror array. Each micromirror could be rotated in four independent directions. Experimentally, we found that the micromirror had a tilting angle of about 2.55° when applying a driving voltage of 40 V. The natural frequency of the micromirrors was 59.1 kHz. |
| first_indexed | 2024-12-10T07:26:55Z |
| format | Article |
| id | doaj.art-f76919ae491f40ed8fad954237006261 |
| institution | Directory Open Access Journal |
| issn | 1424-8220 |
| language | English |
| last_indexed | 2024-12-10T07:26:55Z |
| publishDate | 2009-08-01 |
| publisher | MDPI AG |
| record_format | Article |
| series | Sensors |
| spelling | doaj.art-f76919ae491f40ed8fad9542370062612022-12-22T01:57:41ZengMDPI AGSensors1424-82202009-08-01986219623110.3390/s90806219Manufacture of Micromirror Arrays Using a CMOS-MEMS TechniqueChyan-Chyi WuChing-Liang DaiCheng-Chih HsuPin-Hsu KaoIn this study we used the commercial 0.35 µm CMOS (complementary metal oxide semiconductor) process and simple maskless post-processing to fabricate an array of micromirrors exhibiting high natural frequency. The micromirrors were manufactured from aluminum; the sacrificial layer was silicon dioxide. Because we fabricated the micromirror arrays using the standard CMOS process, they have the potential to be integrated with circuitry on a chip. For post-processing we used an etchant to remove the sacrificial layer and thereby suspend the micromirrors. The micromirror array contained a circular membrane and four fixed beams set symmetrically around and below the circular mirror; these four fan-shaped electrodes controlled the tilting of the micromirror. A MEMS (microelectromechanical system) motion analysis system and a confocal 3D-surface topography were used to characterize the properties and configuration of the micromirror array. Each micromirror could be rotated in four independent directions. Experimentally, we found that the micromirror had a tilting angle of about 2.55° when applying a driving voltage of 40 V. The natural frequency of the micromirrors was 59.1 kHz.http://www.mdpi.com/1424-8220/9/8/6219/micromirror arraymicroactuatorCMOS-MEMS |
| spellingShingle | Chyan-Chyi Wu Ching-Liang Dai Cheng-Chih Hsu Pin-Hsu Kao Manufacture of Micromirror Arrays Using a CMOS-MEMS Technique Sensors micromirror array microactuator CMOS-MEMS |
| title | Manufacture of Micromirror Arrays Using a CMOS-MEMS Technique |
| title_full | Manufacture of Micromirror Arrays Using a CMOS-MEMS Technique |
| title_fullStr | Manufacture of Micromirror Arrays Using a CMOS-MEMS Technique |
| title_full_unstemmed | Manufacture of Micromirror Arrays Using a CMOS-MEMS Technique |
| title_short | Manufacture of Micromirror Arrays Using a CMOS-MEMS Technique |
| title_sort | manufacture of micromirror arrays using a cmos mems technique |
| topic | micromirror array microactuator CMOS-MEMS |
| url | http://www.mdpi.com/1424-8220/9/8/6219/ |
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