Water-based direct photopatterning of stretchable PEDOT:PSS using amphiphilic block copolymers
Abstract The use of water-based chemistry in photolithography during semiconductor fabrication is desirable due to its cost-effectiveness and minimal environmental impact, especially considering the large scale of semiconductor production. Despite these benefits, limited research has reported succes...
| Main Authors: | , , , , , , , |
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| Format: | Article |
| Language: | English |
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Nature Portfolio
2024-04-01
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| Series: | npj Flexible Electronics |
| Online Access: | https://doi.org/10.1038/s41528-024-00308-0 |
| _version_ | 1797219564801490944 |
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| author | Soon Joo Yoon Jeongdae Ha Hyeokjun Lee Jin Tae Park Bin Hyung Lee Kyung-In Jang Anna Yang Yoon Kyeung Lee |
| author_facet | Soon Joo Yoon Jeongdae Ha Hyeokjun Lee Jin Tae Park Bin Hyung Lee Kyung-In Jang Anna Yang Yoon Kyeung Lee |
| author_sort | Soon Joo Yoon |
| collection | DOAJ |
| description | Abstract The use of water-based chemistry in photolithography during semiconductor fabrication is desirable due to its cost-effectiveness and minimal environmental impact, especially considering the large scale of semiconductor production. Despite these benefits, limited research has reported successful demonstrations of water-based photopatterning, particularly for intrinsically water-soluble materials such as Poly(3,4-ethylenedioxythiophene):poly(styrene sulfonate) (PEDOT:PSS) due to significant challenges in achieving selective dissolution during the developing process. In this paper, we propose a method for the direct patterning of PEDOT:PSS in water by introducing an amphiphilic Poly(ethylene glycol)-block-poly(propylene glycol)-block-poly(ethylene glycol) (PEO-PPO-PEO, P123) block copolymer to the PEDOT:PSS film. The addition of the block copolymer enhances the stretchability of the composite film and reduces the hydrophilicity of the film surface, allowing for water absorption only after UV exposure through a photoinitiated reaction with benzophenone. We apply this technique to fabricate tactile and wearable biosensors, both of which benefit from the mechanical stretchability and transparency of PEDOT:PSS. Our method represents a promising solution for water-based photopatterning of hydrophilic materials, with potential for wider applications in semiconductor fabrication. |
| first_indexed | 2024-04-24T12:35:39Z |
| format | Article |
| id | doaj.art-f7babec4b9844f0d9eb7a2554e2ee53a |
| institution | Directory Open Access Journal |
| issn | 2397-4621 |
| language | English |
| last_indexed | 2024-04-24T12:35:39Z |
| publishDate | 2024-04-01 |
| publisher | Nature Portfolio |
| record_format | Article |
| series | npj Flexible Electronics |
| spelling | doaj.art-f7babec4b9844f0d9eb7a2554e2ee53a2024-04-07T11:34:04ZengNature Portfolionpj Flexible Electronics2397-46212024-04-018111010.1038/s41528-024-00308-0Water-based direct photopatterning of stretchable PEDOT:PSS using amphiphilic block copolymersSoon Joo Yoon0Jeongdae Ha1Hyeokjun Lee2Jin Tae Park3Bin Hyung Lee4Kyung-In Jang5Anna Yang6Yoon Kyeung Lee7Department of Nano Convergence Engineering, Jeonbuk National UniversityDepartment of Robotics Engineering, Daegu Gyeongbuk Institute of Science and TechnologyDepartment of Robotics Engineering, Daegu Gyeongbuk Institute of Science and TechnologyDepartment of Nano Convergence Engineering, Jeonbuk National UniversityDivision of Advanced Materials Engineering, Jeonbuk National UniversityDepartment of Robotics Engineering, Daegu Gyeongbuk Institute of Science and TechnologyDepartment of Chemistry and Biochemistry, Swarthmore CollegeDepartment of Nano Convergence Engineering, Jeonbuk National UniversityAbstract The use of water-based chemistry in photolithography during semiconductor fabrication is desirable due to its cost-effectiveness and minimal environmental impact, especially considering the large scale of semiconductor production. Despite these benefits, limited research has reported successful demonstrations of water-based photopatterning, particularly for intrinsically water-soluble materials such as Poly(3,4-ethylenedioxythiophene):poly(styrene sulfonate) (PEDOT:PSS) due to significant challenges in achieving selective dissolution during the developing process. In this paper, we propose a method for the direct patterning of PEDOT:PSS in water by introducing an amphiphilic Poly(ethylene glycol)-block-poly(propylene glycol)-block-poly(ethylene glycol) (PEO-PPO-PEO, P123) block copolymer to the PEDOT:PSS film. The addition of the block copolymer enhances the stretchability of the composite film and reduces the hydrophilicity of the film surface, allowing for water absorption only after UV exposure through a photoinitiated reaction with benzophenone. We apply this technique to fabricate tactile and wearable biosensors, both of which benefit from the mechanical stretchability and transparency of PEDOT:PSS. Our method represents a promising solution for water-based photopatterning of hydrophilic materials, with potential for wider applications in semiconductor fabrication.https://doi.org/10.1038/s41528-024-00308-0 |
| spellingShingle | Soon Joo Yoon Jeongdae Ha Hyeokjun Lee Jin Tae Park Bin Hyung Lee Kyung-In Jang Anna Yang Yoon Kyeung Lee Water-based direct photopatterning of stretchable PEDOT:PSS using amphiphilic block copolymers npj Flexible Electronics |
| title | Water-based direct photopatterning of stretchable PEDOT:PSS using amphiphilic block copolymers |
| title_full | Water-based direct photopatterning of stretchable PEDOT:PSS using amphiphilic block copolymers |
| title_fullStr | Water-based direct photopatterning of stretchable PEDOT:PSS using amphiphilic block copolymers |
| title_full_unstemmed | Water-based direct photopatterning of stretchable PEDOT:PSS using amphiphilic block copolymers |
| title_short | Water-based direct photopatterning of stretchable PEDOT:PSS using amphiphilic block copolymers |
| title_sort | water based direct photopatterning of stretchable pedot pss using amphiphilic block copolymers |
| url | https://doi.org/10.1038/s41528-024-00308-0 |
| work_keys_str_mv | AT soonjooyoon waterbaseddirectphotopatterningofstretchablepedotpssusingamphiphilicblockcopolymers AT jeongdaeha waterbaseddirectphotopatterningofstretchablepedotpssusingamphiphilicblockcopolymers AT hyeokjunlee waterbaseddirectphotopatterningofstretchablepedotpssusingamphiphilicblockcopolymers AT jintaepark waterbaseddirectphotopatterningofstretchablepedotpssusingamphiphilicblockcopolymers AT binhyunglee waterbaseddirectphotopatterningofstretchablepedotpssusingamphiphilicblockcopolymers AT kyunginjang waterbaseddirectphotopatterningofstretchablepedotpssusingamphiphilicblockcopolymers AT annayang waterbaseddirectphotopatterningofstretchablepedotpssusingamphiphilicblockcopolymers AT yoonkyeunglee waterbaseddirectphotopatterningofstretchablepedotpssusingamphiphilicblockcopolymers |