Fabrication of Solid State Nanopore in Thin Silicon Membrane Using Low Cost Multistep Chemical Etching
Nanopore-based analysis is currently an area of great interest in many disciplines with the potential for exceptionally versatile applications in medicine. This work presents a novel step towards fabrication of a single solid-state nanopore (SSSN) in a thin silicon membrane. Silicon nanopores are re...
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| Format: | Article |
| Language: | English |
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MDPI AG
2015-11-01
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| Series: | Materials |
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| Online Access: | http://www.mdpi.com/1996-1944/8/11/5390 |
| _version_ | 1811203508566753280 |
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| author | Muhammad Shuja Khan John Dalton Williams |
| author_facet | Muhammad Shuja Khan John Dalton Williams |
| author_sort | Muhammad Shuja Khan |
| collection | DOAJ |
| description | Nanopore-based analysis is currently an area of great interest in many disciplines with the potential for exceptionally versatile applications in medicine. This work presents a novel step towards fabrication of a single solid-state nanopore (SSSN) in a thin silicon membrane. Silicon nanopores are realized using multistep processes on both sides of n-type silicon-on-insulator (SOI) <100> wafer with resistivity 1–4 Ω·cm. An electrochemical HF etch with low current density (0.47 mA/cm2) is employed to produce SSSN. Blue LED is considered to emit light in a narrow band region which facilitates the etching procedure in a unilateral direction. This helps in production of straight nanopores in n-type Si. Additionally, a variety of pore diameters are demonstrated using different HF concentrations. Atomic force microscopy is used to demonstrate the surface morphology of the fabricated pores in non-contact mode. Pore edges exhibit a pronounced rounded shape and can offer high stability to fluidic artificial lipid bilayer to study membrane proteins. Electrochemically-fabricated SSSN has excellent smoothness and potential applications in diagnostics and pharmaceutical research on transmembrane proteins and label free detection. |
| first_indexed | 2024-04-12T02:56:48Z |
| format | Article |
| id | doaj.art-fab28642ed92473fb8886511fec173cc |
| institution | Directory Open Access Journal |
| issn | 1996-1944 |
| language | English |
| last_indexed | 2024-04-12T02:56:48Z |
| publishDate | 2015-11-01 |
| publisher | MDPI AG |
| record_format | Article |
| series | Materials |
| spelling | doaj.art-fab28642ed92473fb8886511fec173cc2022-12-22T03:50:47ZengMDPI AGMaterials1996-19442015-11-018117389740010.3390/ma8115390ma8115390Fabrication of Solid State Nanopore in Thin Silicon Membrane Using Low Cost Multistep Chemical EtchingMuhammad Shuja Khan0John Dalton Williams1Electrical and Computer Engineering Department, The University of Alabama in Huntsville, Huntsville, AL 35899, USAElectrical and Computer Engineering Department, The University of Alabama in Huntsville, Huntsville, AL 35899, USANanopore-based analysis is currently an area of great interest in many disciplines with the potential for exceptionally versatile applications in medicine. This work presents a novel step towards fabrication of a single solid-state nanopore (SSSN) in a thin silicon membrane. Silicon nanopores are realized using multistep processes on both sides of n-type silicon-on-insulator (SOI) <100> wafer with resistivity 1–4 Ω·cm. An electrochemical HF etch with low current density (0.47 mA/cm2) is employed to produce SSSN. Blue LED is considered to emit light in a narrow band region which facilitates the etching procedure in a unilateral direction. This helps in production of straight nanopores in n-type Si. Additionally, a variety of pore diameters are demonstrated using different HF concentrations. Atomic force microscopy is used to demonstrate the surface morphology of the fabricated pores in non-contact mode. Pore edges exhibit a pronounced rounded shape and can offer high stability to fluidic artificial lipid bilayer to study membrane proteins. Electrochemically-fabricated SSSN has excellent smoothness and potential applications in diagnostics and pharmaceutical research on transmembrane proteins and label free detection.http://www.mdpi.com/1996-1944/8/11/5390solid state nanoporesiliconelectrochemical etchingHFatomic force microscopy |
| spellingShingle | Muhammad Shuja Khan John Dalton Williams Fabrication of Solid State Nanopore in Thin Silicon Membrane Using Low Cost Multistep Chemical Etching Materials solid state nanopore silicon electrochemical etching HF atomic force microscopy |
| title | Fabrication of Solid State Nanopore in Thin Silicon Membrane Using Low Cost Multistep Chemical Etching |
| title_full | Fabrication of Solid State Nanopore in Thin Silicon Membrane Using Low Cost Multistep Chemical Etching |
| title_fullStr | Fabrication of Solid State Nanopore in Thin Silicon Membrane Using Low Cost Multistep Chemical Etching |
| title_full_unstemmed | Fabrication of Solid State Nanopore in Thin Silicon Membrane Using Low Cost Multistep Chemical Etching |
| title_short | Fabrication of Solid State Nanopore in Thin Silicon Membrane Using Low Cost Multistep Chemical Etching |
| title_sort | fabrication of solid state nanopore in thin silicon membrane using low cost multistep chemical etching |
| topic | solid state nanopore silicon electrochemical etching HF atomic force microscopy |
| url | http://www.mdpi.com/1996-1944/8/11/5390 |
| work_keys_str_mv | AT muhammadshujakhan fabricationofsolidstatenanoporeinthinsiliconmembraneusinglowcostmultistepchemicaletching AT johndaltonwilliams fabricationofsolidstatenanoporeinthinsiliconmembraneusinglowcostmultistepchemicaletching |