Suppression of hot electron effect in AlGaN/GaN HEMT with multi-grooves barrier-etched structure

A multi-grooves barrier-etched structure between barrier layer and passivation layer is proposed in this paper to suppress the hot electron effect at the gate edge on the drain side in the p-GaN gate AlGaN/GaN high-electron-mobility transistor. In the TCAD simulations, the groove structure induces e...

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Bibliographic Details
Main Authors: Xuanlin Li, Jie Xu, Weijing Liu
Format: Article
Language:English
Published: IOP Publishing 2023-01-01
Series:Materials Research Express
Subjects:
Online Access:https://doi.org/10.1088/2053-1591/acd2aa

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