Suppression of hot electron effect in AlGaN/GaN HEMT with multi-grooves barrier-etched structure
A multi-grooves barrier-etched structure between barrier layer and passivation layer is proposed in this paper to suppress the hot electron effect at the gate edge on the drain side in the p-GaN gate AlGaN/GaN high-electron-mobility transistor. In the TCAD simulations, the groove structure induces e...
Main Authors: | Xuanlin Li, Jie Xu, Weijing Liu |
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Format: | Article |
Language: | English |
Published: |
IOP Publishing
2023-01-01
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Series: | Materials Research Express |
Subjects: | |
Online Access: | https://doi.org/10.1088/2053-1591/acd2aa |
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