Simulation and theoretical study of AlGaN-based deep-ultraviolet light-emitting diodes with a stepped electron barrier layer

Owing to the COVID-19 outbreak, sterilization of deep-ultraviolet light-emitting diodes (DUV LEDs) has attracted increasing attention. Effectively improving the radiative recombination efficiency and mitigating the efficiency degradation, mainly caused by electron leakage and nonradiative recombinat...

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Main Authors: Fengyi Zhao, Wei Jia, Hailiang Dong, Zhigang Jia, Tianbao Li, Chunyan Yu, Zhuxia Zhang, Bingshe Xu
Format: Article
Language:English
Published: AIP Publishing LLC 2022-12-01
Series:AIP Advances
Online Access:http://dx.doi.org/10.1063/5.0127070
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author Fengyi Zhao
Wei Jia
Hailiang Dong
Zhigang Jia
Tianbao Li
Chunyan Yu
Zhuxia Zhang
Bingshe Xu
author_facet Fengyi Zhao
Wei Jia
Hailiang Dong
Zhigang Jia
Tianbao Li
Chunyan Yu
Zhuxia Zhang
Bingshe Xu
author_sort Fengyi Zhao
collection DOAJ
description Owing to the COVID-19 outbreak, sterilization of deep-ultraviolet light-emitting diodes (DUV LEDs) has attracted increasing attention. Effectively improving the radiative recombination efficiency and mitigating the efficiency degradation, mainly caused by electron leakage and nonradiative recombination, have also emerged as two of the main issues to be addressed. In this study, a DUV LED epitaxial structure with a novel electron-blocking layer (EBL) is proposed. The DUV LED with a luminescence wavelength of ∼297 nm was formed by the stepwise variation of the Al component. Through the simulation and analysis of its performance parameters, we found that, compared to the conventional EBL structure, this new EBL structure not only reduces the electron leakage to the p-region effectively but also increases the hole injection into the active region, resulting in an increase in carrier concentration in the active region, a two-to-three-fold increase in the radiative recombination rate, and a 58% increase in the internal quantum efficiency, thus alleviating the efficiency droop and achieving a more efficient operation at high current densities.
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spelling doaj.art-fb922a5432924e66854cd794d634d5552023-01-19T16:47:09ZengAIP Publishing LLCAIP Advances2158-32262022-12-011212125003125003-710.1063/5.0127070Simulation and theoretical study of AlGaN-based deep-ultraviolet light-emitting diodes with a stepped electron barrier layerFengyi Zhao0Wei Jia1Hailiang Dong2Zhigang Jia3Tianbao Li4Chunyan Yu5Zhuxia Zhang6Bingshe Xu7Key Laboratory of Interface Science and Engineering in Advanced Materials, Taiyuan University of Technology, Taiyuan, Shanxi, ChinaKey Laboratory of Interface Science and Engineering in Advanced Materials, Taiyuan University of Technology, Taiyuan, Shanxi, ChinaKey Laboratory of Interface Science and Engineering in Advanced Materials, Taiyuan University of Technology, Taiyuan, Shanxi, ChinaKey Laboratory of Interface Science and Engineering in Advanced Materials, Taiyuan University of Technology, Taiyuan, Shanxi, ChinaKey Laboratory of Interface Science and Engineering in Advanced Materials, Taiyuan University of Technology, Taiyuan, Shanxi, ChinaKey Laboratory of Interface Science and Engineering in Advanced Materials, Taiyuan University of Technology, Taiyuan, Shanxi, ChinaKey Laboratory of Interface Science and Engineering in Advanced Materials, Taiyuan University of Technology, Taiyuan, Shanxi, ChinaKey Laboratory of Interface Science and Engineering in Advanced Materials, Taiyuan University of Technology, Taiyuan, Shanxi, ChinaOwing to the COVID-19 outbreak, sterilization of deep-ultraviolet light-emitting diodes (DUV LEDs) has attracted increasing attention. Effectively improving the radiative recombination efficiency and mitigating the efficiency degradation, mainly caused by electron leakage and nonradiative recombination, have also emerged as two of the main issues to be addressed. In this study, a DUV LED epitaxial structure with a novel electron-blocking layer (EBL) is proposed. The DUV LED with a luminescence wavelength of ∼297 nm was formed by the stepwise variation of the Al component. Through the simulation and analysis of its performance parameters, we found that, compared to the conventional EBL structure, this new EBL structure not only reduces the electron leakage to the p-region effectively but also increases the hole injection into the active region, resulting in an increase in carrier concentration in the active region, a two-to-three-fold increase in the radiative recombination rate, and a 58% increase in the internal quantum efficiency, thus alleviating the efficiency droop and achieving a more efficient operation at high current densities.http://dx.doi.org/10.1063/5.0127070
spellingShingle Fengyi Zhao
Wei Jia
Hailiang Dong
Zhigang Jia
Tianbao Li
Chunyan Yu
Zhuxia Zhang
Bingshe Xu
Simulation and theoretical study of AlGaN-based deep-ultraviolet light-emitting diodes with a stepped electron barrier layer
AIP Advances
title Simulation and theoretical study of AlGaN-based deep-ultraviolet light-emitting diodes with a stepped electron barrier layer
title_full Simulation and theoretical study of AlGaN-based deep-ultraviolet light-emitting diodes with a stepped electron barrier layer
title_fullStr Simulation and theoretical study of AlGaN-based deep-ultraviolet light-emitting diodes with a stepped electron barrier layer
title_full_unstemmed Simulation and theoretical study of AlGaN-based deep-ultraviolet light-emitting diodes with a stepped electron barrier layer
title_short Simulation and theoretical study of AlGaN-based deep-ultraviolet light-emitting diodes with a stepped electron barrier layer
title_sort simulation and theoretical study of algan based deep ultraviolet light emitting diodes with a stepped electron barrier layer
url http://dx.doi.org/10.1063/5.0127070
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