A Design Method to Improve Temperature Uniformity on Wafer for Rapid Thermal Processing

Single-wafer rapid thermal processing (RTP) is widely used in semiconductor manufacturing. Achieving temperature uniformity on silicon wafer is a major challenge in RTP control. In this work, a lamp configuration including five concentric lamp zones is designed to obtain uniform temperature distribu...

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Bibliographic Details
Main Authors: Peng Huang, Hongguan Yang
Format: Article
Language:English
Published: MDPI AG 2018-09-01
Series:Electronics
Subjects:
Online Access:http://www.mdpi.com/2079-9292/7/10/213